Effects of excess Pb and substrate on crystallization processes of amorphous Pb(Zr, Ti)O3 thin films prepared by RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 9 SUPPL. B, 1997, Pages 5793-5798

  Fukuda, Yukio ^a   Aoki, Katsuhiro ^a  

^a Texas Instruments Japan Ltd   (Japan)

Author keywords

Amorphous PZT; Crystallization process; Excess Pb; Ferroelectric property; Sputtering

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; COMPOSITION EFFECTS; CRYSTALLIZATION; FERROELECTRICITY; IRIDIUM; LEAD COMPOUNDS; MAGNETRON SPUTTERING; PLATINUM; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

LEAD ZIRCONATE TITANATE;

FERROELECTRIC MATERIALS;

EID: 0031223593     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5793     Document Type: Article

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