메뉴 건너뛰기




Volumn 192, Issue 1, 2005, Pages 81-87

Deposition of nanostructured titania films by particle-assisted MOCVD

Author keywords

Atmospheric pressure; Nanostructure; Titania; Titanium tetraisopropoxide

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DIFFUSION; SCANNING; THERMOPHORESIS; THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY;

EID: 11344261785     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.03.003     Document Type: Article
Times cited : (46)

References (23)
  • 9
    • 84876608741 scopus 로고    scopus 로고
    • 28th IEEE PVSC 2000 (15-22 September) 375 IEEE Piscataway, NJ, USA
    • Richards B.S. Cotter J.E. Honsberg C.B. Wenham S.R. 28th IEEE PVSC 2000 (15-22 September) 375 IEEE Piscataway, NJ, USA
    • (2000) , pp. 375
    • Richards, B.S.1    Cotter, J.E.2    Honsberg, C.B.3    Wenham, S.R.4
  • 20
    • 0011345741 scopus 로고
    • Effects of homogeneous reaction on the chemical vapor deposition of titanium dioxide
    • PhD dissertation, Yale University
    • Collins J. Effects of homogeneous reaction on the chemical vapor deposition of titanium dioxide. PhD dissertation, Yale University, 1994.
    • (1994)
    • Collins, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.