Novel hybrid abrasive particles for oxide CMP applications

ECS Transactions

Volumn 3, Issue 41, 2006, Pages 9-19

  Mudhivarthi, Subrahmanya ^a,b   Coutinho, Cecil ^a   Kumar, Ashok ^a,b   Gupta, Vinay ^a  

^a University of South Florida   (United States)

^b UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT SCATTERING; POLISHING; PRECIPITATION (CHEMICAL); SURFACE ROUGHNESS;

ABRASIVE PARTICLES; COLLOIDAL PRECIPITATION; FTIR SPECTROSCOPY; INORGANIC OXIDES; MECHANICAL STRESS; POLYMERIC PARTICLES; SURFACE DAMAGES; TRIBOLOGICAL CHARACTERISTICS;

CHEMICAL MECHANICAL POLISHING;

EID: 57649238183     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2819477     Document Type: Conference Paper

References (15)

1. A. K. Sikder, Swetha Thagella, Ashok Kumar, and Jiro Yota, J. Mater. Res., 19 (4), 996, (2004).
2. P. Zantye, S. Mudhivarthi, and A, Kumar, Y.S. Obeng, J. Vac. Sci. Technol.- A., 23(5), 1892, (2005).
3. A. K. Sikder, I. M. Irfan, Ashok Kumar, A. Belyaev, S. Ostapenko, M. Calves, J. P. Harmon and J. M. Anthony, Mat. Res. Soc. Sym. Proc., 670, MI.8.1-7, (2001).
4. th CMP-MIC Conf., 120, (2003).
5. A. K. Sikder, P. Zantye, S. Thagella and Ashok Kumar, Mat. Res. Soc. Sym. Proc. 767, F7.3 (2003).
6. R. Ganesan, T. K. Das, A. K. Sikder and A. Kumar, IEEE Trans. Semicond. Manuf., November, (2003).
7. T. Y. Teo, W. L. Goh, V. S. K. Lim, L. S. Leong, T. Y. Tse, and L. Chan, J. Vac. Sci. Technol. B 22.1., 65, (2004)
8. L. Zhang, S. Raghavan, M. Weling, J. Vac. Sci. Technol. B 17.5., 2248, (1999).
9. A. Jindal, S. Hegde, and S. V. Babu, Electrochem. Solid-State Lett., 5 (7), G48, (2002).
10. J.Y. Song, Y.H. Chen, S.N. Lee, W.C. Chiou, T.C. Tseng, H.H. Kuo, C. J. Chuang, K.C. Lin, S.M. Jang, and M.S. Liang, Symp. VLSI Tech. Digest of Technical Papers, 9B-1, 123, (2003).
11. P. Wrschka, J. Hernandez, G S. Oehrlein, J. A. Negrych, G. Haag, P. Rau and J. E. Currie, J. Electrochem. Soc., 148, (6), G321, (2001).
12. K. Cheemalapati, A. Chowdhury, V. Duvvuru, Yong Lin, Kwok Tang, Guomin Bian, Lily Yao, and Yuzhuo Li, Mat. Res. Soc. Symp. Proc., 816, K1.7.1., (2004).
13. E. Bourgeat-Lami, I. Tissot, and F. Lefebvre, Macromolecules, 35, (16), 6185, (2002).
14. I. Tissot, J. P. Reymond, F. Iefebre, E. Bourgeat-Lami, Chemistry of Materials, 14, (3), 1325, (2002).
15. X. Ding, Y. Jinag, K. Yu, H. Bala, N. Tao, J. Zhao, Z. Wang, Materials Letters, 58, (11), 1722, (2004).