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Applied Physics Letters

Volumn 93, Issue 23, 2008, Pages

Dielectric properties of Ba0.5Sr0.5TiO 3/SiN bilayered thin films grown on Pt-coated sapphire substrates

(5) Xiong, Niandeng a Jiang, Shuwen a Li, Yanrong a Tan, Lefan a Li, Ruguan a

a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA (China)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM; CERAMIC CAPACITORS; CORUNDUM; DIELECTRIC PROPERTIES; PLATINUM; SAPPHIRE; SILICON NITRIDE; THIN FILMS; TITANIUM OXIDES;

BA0.5SR0.5TIO3; DIELECTRIC MEASUREMENTS; FIGURE OF MERITS; LOSS TANGENTS; MULTILAYERED; PLANE SAPPHIRES; SAPPHIRE SUBSTRATES; SERIES CONNECTIONS; SIN LAYERS; THICKNESS EFFECTS; THICKNESS RATIOS;

SOLIDS;

EID: 57649137948 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3049127 Document Type: Article

Times cited : (24)

References (24)

1
- 0242335952
- 0003-6951 10.1063/1.1619213.
- A. Vorobiev, P. Rundqvist, K. Khamchane, and S. Gevorgian, Appl. Phys. Lett. 0003-6951 10.1063/1.1619213 83, 3144 (2003).
- (2003) Appl. Phys. Lett. , vol.83 , pp. 3144
- Vorobiev, A.¹ Rundqvist, P.² Khamchane, K.³ Gevorgian, S.⁴

2
- 1842484069
- 1385-3449 10.1023/B:JECR.0000015661.81386.e6.
- A. K. Tagantsev, V. O. Sherman, K. F. Astaev, J. Venkatesh, and N. Setter, J. Electroceram. 1385-3449 10.1023/B:JECR.0000015661.81386.e6 11, 5 (2003).
- (2003) J. Electroceram. , vol.11 , pp. 5
- Tagantsev, A.K.¹ Sherman, V.O.² Astaev, K.F.³ Venkatesh, J.⁴ Setter, N.⁵

3
- 18044402505
- 0003-6951 10.1063/1.1343499.
- C. L. Chen, J. Shen, S. Y. Shen, G. P. Luo, C. W. Chu, F. A. Miranda, F. W. V. Keuls, I. C. Jiang, E. I. Meletis, and H. Y. Chang, Appl. Phys. Lett. 0003-6951 10.1063/1.1343499 78, 652 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 652
- Chen, C.L.¹ Shen, J.² Shen, S.Y.³ Luo, G.P.⁴ Chu, C.W.⁵ Miranda, F.A.⁶ Keuls, F.W.V.⁷ Jiang, I.C.⁸ Meletis, E.I.⁹ Chang, H.Y.¹⁰

4
- 0033295725
- 1058-4587 10.1080/10584589908215593.
- D. S. Korn and H. D. Wu, Integr. Ferroelectr. 1058-4587 10.1080/10584589908215593 24, 215 (1999).
- (1999) Integr. Ferroelectr. , vol.24 , pp. 215
- Korn, D.S.¹ Wu, H.D.²

5
- 33847206105
- 0036-8075 10.1126/science.1129564.
- J. F. Scott, Science 0036-8075 10.1126/science.1129564 315, 954 (2007).
- (2007) Science , vol.315 , pp. 954
- Scott, J.F.¹

6
- 3242702460
- 0003-6951 10.1063/1.1767605.
- B. L. Cheng, C. Wang, S. Y. Wang, T. W. Button, H. B. Lu, Y. L. Zhou, Z. H. Chen, and G. Z. Yang, Appl. Phys. Lett. 0003-6951 10.1063/1.1767605 84, 5431 (2004).
- (2004) Appl. Phys. Lett. , vol.84 , pp. 5431
- Cheng, B.L.¹ Wang, C.² Wang, S.Y.³ Button, T.W.⁴ Lu, H.B.⁵ Zhou, Y.L.⁶ Chen, Z.H.⁷ Yang, G.Z.⁸

7
- 33748892269
- 0021-8979 10.1063/1.2336999.
- N. Setter, D. Damjanovic, L. Eng, G. Fox, S. Gevorgian, S. Hong, A. Kingon, H. Kohlstedt, N. Y. Park, G. B. Stephenson, I. Stolitchnov, A. K. Taganster, D. V. Taylor, T. Yamada, and S. Streiffer, J. Appl. Phys. 0021-8979 10.1063/1.2336999 100, 051606 (2006).
- (2006) J. Appl. Phys. , vol.100 , pp. 051606
- Setter, N.¹ Damjanovic, D.² Eng, L.³ Fox, G.⁴ Gevorgian, S.⁵ Hong, S.⁶ Kingon, A.⁷ Kohlstedt, H.⁸ Park, N.Y.⁹ Stephenson, G.B.¹⁰ Stolitchnov, I.¹¹ Taganster, A.K.¹² Taylor, D.V.¹³ Yamada, T.¹⁴ Streiffer, S.¹⁵

8
- 33748467174
- 0003-6951 10.1063/1.2236099.
- H. S. Kim, T. S. Hyum, H. G. Kim, I. D. Kim, T. S. Yun, and J. C. Lee, Appl. Phys. Lett. 0003-6951 10.1063/1.2236099 89, 052902 (2006).
- (2006) Appl. Phys. Lett. , vol.89 , pp. 052902
- Kim, H.S.¹ Hyum, T.S.² Kim, H.G.³ Kim, I.D.⁴ Yun, T.S.⁵ Lee, J.C.⁶

9
- 0142058348
- 0003-6951 10.1063/1.1609658.
- S. E. Moon, E. K. Kim, M. H. Kwak, H. C. Ryu, Y. T. Kim, K. Y. Kang, and S. T. Lee, Appl. Phys. Lett. 0003-6951 10.1063/1.1609658 83, 2166 (2003).
- (2003) Appl. Phys. Lett. , vol.83 , pp. 2166
- Moon, S.E.¹ Kim, E.K.² Kwak, M.H.³ Ryu, H.C.⁴ Kim, Y.T.⁵ Kang, K.Y.⁶ Lee, S.T.⁷

10
- 31844441626
- 0021-4922 10.1143/JJAP.44.6881.
- S. Ito, K. Takahashi, S. Okamoto, and I. P. Koutsaroff, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.44.6881 44, 6881 (2005).
- (2005) Jpn. J. Appl. Phys., Part 1 , vol.44 , pp. 6881
- Ito, S.¹ Takahashi, K.² Okamoto, S.³ Koutsaroff, I.P.⁴

11
- 0037164838
- 0003-6951 10.1063/1.1531218.
- K. H. Yoon, J. H. Sohn, B. D. Lee, and D. H. Knag, Appl. Phys. Lett. 0003-6951 10.1063/1.1531218 81, 5012 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 5012
- Yoon, K.H.¹ Sohn, J.H.² Lee, B.D.³ Knag, D.H.⁴

12
- 0032045710
- 0021-8979 10.1063/1.366595.
- C. S. Hwang, B. T. Lee, C. S. Kang, J. W. Kim, K. H. Lee, H. J. Cho, H. Horii, W. D. Kim, S. I. Lee, Y. B. Ro, and M. Y. Lee, J. Appl. Phys. 0021-8979 10.1063/1.366595 83, 3703 (1998).
- (1998) J. Appl. Phys. , vol.83 , pp. 3703
- Hwang, C.S.¹ Lee, B.T.² Kang, C.S.³ Kim, J.W.⁴ Lee, K.H.⁵ Cho, H.J.⁶ Horii, H.⁷ Kim, W.D.⁸ Lee, S.I.⁹ Ro, Y.B.¹⁰ Lee, M.Y.¹¹

13
- 28844500706
- 0003-6951 10.1063/1.2139988.
- W. Chang, J. M. Pond, S. W. Kirchoefer, and J. A. Bellotti, Appl. Phys. Lett. 0003-6951 10.1063/1.2139988 87, 242904 (2005).
- (2005) Appl. Phys. Lett. , vol.87 , pp. 242904
- Chang, W.¹ Pond, J.M.² Kirchoefer, S.W.³ Bellotti, J.A.⁴

14
- 0040992761
- 0003-6951 10.1063/1.1340863.
- B. H. Park, E. J. Peterson, Q. X. Jia, J. Lee, X. Zhang, W. Si, and X. X. Xi, Appl. Phys. Lett. 0003-6951 10.1063/1.1340863 78, 533 (2001).
- (2001) Appl. Phys. Lett. , vol.78 , pp. 533
- Park, B.H.¹ Peterson, E.J.² Jia, Q.X.³ Lee, J.⁴ Zhang, X.⁵ Si, W.⁶ Xi, X.X.⁷

15
- 1142280283
- 0021-8979 10.1063/1.1638615.
- K. B. Chong, L. B. Kong, L. F. Chen, L. Yan, C. Y. Tan, T. Yang, C. K. Ong, and T. Osipowicz, J. Appl. Phys. 0021-8979 10.1063/1.1638615 95, 1416 (2004).
- (2004) J. Appl. Phys. , vol.95 , pp. 1416
- Chong, K.B.¹ Kong, L.B.² Chen, L.F.³ Yan, L.⁴ Tan, C.Y.⁵ Yang, T.⁶ Ong, C.K.⁷ Osipowicz, T.⁸

16
- 1342344852
- M. Jain, S. B. Majumder, R. S. Katiyar, and A. S. Bhalla, Thin Solid Films 447-448, 537 (2004).
- (2004) Thin Solid Films , vol.447-448 , pp. 537
- Jain, M.¹ Majumder, S.B.² Katiyar, R.S.³ Bhalla, A.S.⁴

17
- 43349108765
- 0003-6951 10.1063/1.2919080.
- M. W. Cole, C. V. Weiss, E. Ngo, S. Hirsch, L. A. Coryell, and S. P. Alpay, Appl. Phys. Lett. 0003-6951 10.1063/1.2919080 92, 182906 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 182906
- Cole, M.W.¹ Weiss, C.V.² Ngo, E.³ Hirsch, S.⁴ Coryell, L.A.⁵ Alpay, S.P.⁶

18
- 39749159340
- 0003-6951 10.1063/1.2870079.
- M. W. Cole, E. Ngo, S. Hirsch, M. B. Okatan, and S. P. Alpa, Appl. Phys. Lett. 0003-6951 10.1063/1.2870079 92, 072906 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 072906
- Cole, M.W.¹ Ngo, E.² Hirsch, S.³ Okatan, M.B.⁴ Alpa, S.P.⁵

19
- 34548039740
- 0021-8979 10.1063/1.2761849.
- M. W. Cole, E. Ngo, S. Hirsch, J. D. Demaree, S. Zhong, and S. P. Alpay, J. Appl. Phys. 0021-8979 10.1063/1.2761849 102, 034104 (2007).
- (2007) J. Appl. Phys. , vol.102 , pp. 034104
- Cole, M.W.¹ Ngo, E.² Hirsch, S.³ Demaree, J.D.⁴ Zhong, S.⁵ Alpay, S.P.⁶

20
- 44449096256
- 0003-6951 10.1063/1.2936305.
- A. Podpirka, M. W. Cole, and S. Ramanathan, Appl. Phys. Lett. 0003-6951 10.1063/1.2936305 92, 212906 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 212906
- Podpirka, A.¹ Cole, M.W.² Ramanathan, S.³

21
- 33847669193
- 0003-6951 10.1063/1.2710005.
- S. Zhong, S. P. Alpay, M. W. Cole, E. Ngo, S. Hirsch, and J. D. Demaree, Appl. Phys. Lett. 0003-6951 10.1063/1.2710005 90, 092901 (2007).
- (2007) Appl. Phys. Lett. , vol.90 , pp. 092901
- Zhong, S.¹ Alpay, S.P.² Cole, M.W.³ Ngo, E.⁴ Hirsch, S.⁵ Demaree, J.D.⁶

22
- 33846439727
- 0003-6951 10.1063/1.2433029.
- W. Zhu, J. Cheng, S. W. Yu, J. Gong, and Z. Y. Meng, Appl. Phys. Lett. 0003-6951 10.1063/1.2433029 90, 032907 (2007).
- (2007) Appl. Phys. Lett. , vol.90 , pp. 032907
- Zhu, W.¹ Cheng, J.² Yu, S.W.³ Gong, J.⁴ Meng, Z.Y.⁵

23
- 43349097530
- 0003-6951 10.1063/1.2924278.
- W. Fu, H. Wang, L. Cao, and Y. Zhou, Appl. Phys. Lett. 0003-6951 10.1063/1.2924278 92, 182910 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 182910
- Fu, W.¹ Wang, H.² Cao, L.³ Zhou, Y.⁴

24
- 10944262315
- 0003-6951 10.1063/1.1821656.
- I. D. Kim, H. L. Tuller, H. S. Kim, and J. S. Park, Appl. Phys. Lett. 0003-6951 10.1063/1.1821656 85, 4705 (2004).
- (2004) Appl. Phys. Lett. , vol.85 , pp. 4705
- Kim, I.D.¹ Tuller, H.L.² Kim, H.S.³ Park, J.S.⁴

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