RAFT technology for the production of advanced photoresist polymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Sheehan, Michael T ^b   Farnham, William B ^a   Okazaki, Hiroshi ^b   Sounik, James R ^c   Clark, George ^c  

^a DUPONT COMPANY   (United States)

^b DuPont Electronic Polymers LP   (United States)

^c DuPont Electronic Polymers LP   (United States)

Author keywords

193i; 193nm lithography; Block copolymer; Immersion; Photoresist; Polydispersity; RAFT

Indexed keywords

193I; 193NM LITHOGRAPHY; APPLICATIONS.; BLOCK LENGTHS; CONVENTIONAL DRIES; DEFECT COUNTS; FEATURE SIZES; HIGH YIELDS; IMMERSION; IMMERSION IMAGING; LOW SURFACE ENERGIES; METHACRYLATE MONOMERS; PHOTORESIST MATERIALS; POLYMER APPLICATIONS; POLYMER ARCHITECTURES; RAFT; RAFT POLYMERIZATIONS; REVERSIBLE ADDITION FRAGMENTATION CHAIN TRANSFERS; SINGLE LAYERS; SOLID/LIQUID INTERFACES; SOLUTION BEHAVIORS; STYRENIC MONOMERS; SURFACE ENERGIES;

BLOCK COPOLYMERS; CHEMICAL ANALYSIS; CONTACT ANGLE; COPOLYMERIZATION; COPOLYMERS; FREE RADICAL POLYMERIZATION; INTERFACIAL ENERGY; LIGHT WATER REACTORS; LIVING POLYMERIZATION; MONOMERS; PHOTORESISTORS; POLYDISPERSITY; POLYMERS; SURFACE CHEMISTRY; SURFACE TENSION; SURFACE TREATMENT; TECHNOLOGY;

PHOTORESISTS;

EID: 57349126840     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772115     Document Type: Conference Paper

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