Selection and evaluation of developer-Soluble topcoat for 193 nm immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Wei, Yayi ^a   Petrillo, K ^b   Brandl, S ^a   Goodwin, F ^a   Benson, P ^c   Housley, R ^c   Okoroanyanwu, U ^d  

^a INFINEON TECHNOLOGIES   (United States)

^b IBM   (United States)

^c MICRON TECHNOLOGY INC   (United States)

^d AMD   (United States)

Author keywords

193nm immersion lithography; Resists; Topcoat

Indexed keywords

193NM IMMERSION LITHOGRAPHY; RESISTS; TOPCOAT;

DEFECTS; IMAGE ANALYSIS; IMAGE PROCESSING; OPTIMIZATION; SOLUBILITY;

LITHOGRAPHY;

EID: 33745615445     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655725     Document Type: Conference Paper

References (7)

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