Polymers with well-controlled molecular weight for DUV/VUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 548-557

  Lee, Ting Yu ^a   Yu, Chao Ying ^a   Hsu, Meei Yu ^a   Chang, Jui Fa ^a   Cheng, Bing Ming ^b   Lu, Hsiao Chi ^b   Chen, Hong Kai ^b   Fung, Hok Sum ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

157 nm lithography; 193 nm lithography; Controlled radical polymerization; Molecular weight distribution; Photoresists; Synchrotron radiation

Indexed keywords

COMPOSITION; COPOLYMERS; FLUORINE CONTAINING POLYMERS; MOLECULAR WEIGHT DISTRIBUTION; MONOMERS; PHOTORESISTS; POLYMERIZATION; SPECTROMETERS; SYNCHROTRON RADIATION; SYNTHESIS (CHEMICAL);

FLUORINATED NORBORNENE TYPE MONOMERS; MILD REACTION CONDITION CHANGE; POLYMER RESIN; SYNCHROTRON RADIATION SPECTROMETERS;

PHOTOLITHOGRAPHY;

EID: 0141611701     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485098     Document Type: Conference Paper

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