Formation mechanism of 193nm immersion defects and defect reduction strategies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Wei, Yayi ^a,b   Brandl, Stefan ^a   Goodwin, Frank ^a  

^a Qimonda North America   (United States)

^b AZ Electronic Materials USA Corp   (United States)

Author keywords

193nm immersion lithography; Defectivity; Process; Resist and topcoat

Indexed keywords

193NM IMMERSION LITHOGRAPHY; 193NM IMMERSIONS; DEFECT REDUCTIONS; DEFECTIVITY; FORMATION MECHANISMS; RESIST AND TOPCOAT; SIMULATION RESULTS;

DEFECTS;

EID: 57349124906     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771221     Document Type: Conference Paper

References (17)

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