Study of air bubble induced light scattering effect on image quality in 193 nm immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 477-486

  Fan, Yongfa ^a   Lafferty, Neal ^a   Bourov, Anatoly ^a   Zavyalova, Lena ^a   Smith, Bruce W ^a  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Immersion; Mie scattering; Optical lithography

Indexed keywords

IMMERSION; IMMERSION LITHOGRAPHY; MIE SCATTERING; NUMERICAL APERTURES (NA);

GEOMETRICAL OPTICS; IMAGE QUALITY; IMAGING TECHNIQUES; INTERFEROMETRY; LIGHT INTERFERENCE; LIGHT SCATTERING; MICROELECTRONICS; PHOTOLITHOGRAPHY; POLYSTYRENES; REFRACTIVE INDEX; TRANSPARENCY;

BUBBLES (IN FLUIDS);

EID: 3843138266     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537255     Document Type: Conference Paper

References (5)

1. B. W. Smith, H. Kan, et al, "Water immersion Optical Lithography for the 45 nm node", SPIE Optical Microlithography XVI, pp. 679-689, 2003.
2. 3 1(1), pp. 7-12, 2002.
3. S. Owa, H. Nagasaka, "Immersion lithography: its potential performance and issues", SPIE Optical Microlithography XVI, pp. 724-732, 2004.
4. P. L. Marston, "Light scattering from bubbles in water", Ocean 89 Part 4 Acoust Arct Stud, pp. 1186-1193, 1989.
5. C. F. Bohren, D. R. Huffman, Absorption and Scattering of Light by Small Particles, John Wiley & Sons, 1983