Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 243-253

  De Bisschop, Peter ^a   Erdmann, Andreas ^b   Rathsfeld, Andreas ^c  

^a IMEC   (Belgium)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^c WEIERSTRASS INSTITUTE FOR APPLIED ANALYSIS AND STOCHASTICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BUBBLES (IN FLUIDS); COMPUTER SIMULATION; DEFECTS; PHOTOLITHOGRAPHY;

AIR BUBBLES; DOSE REDUCTIONS; IMMERSION; LINE/SPACE PATTERNING;

IMAGING TECHNIQUES;

EID: 22144498788     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599792     Document Type: Conference Paper

References (17)

1. ISMT Immersion Lithography Workshops: December 2002, San Francisco; June 2003, Austin; January 2004, Los Angeles and August 2004, Vancouver.
2. nd Immersion Workshop, June 11, 2003
3. D. Flagello, B. Streefkerk, J. Mulkens, Status and outlook for ArF Immersion Lithography', contribution to the 'International Symposium on Immersion Lithography, August 2-5, 2004, Vancouver
4. S. Donders, R. Moerman, H. Boom, Bubble investigation for Immersion Lithography, contribution to the 'International Symposium on Immersion Lithography, August 2-5, 2004, Vancouver
5. H. Hata, The development of Immersion Exposure Tools - Canon Update, contribution to the 'International Symposium on Immersion Lithography, August 2-5, 2004, Vancouver
6. T. A. Shedd, A general model for estimating bubble dissolution and droplet evaporation times, submitted to JM3.
7. M. Switkes et. al., Scattering in liquid immersion lithography, Optical Microlithography XVII, Proceedings of SPIE, Vol. 5377 (2004) p 469
8. Yongfa Fan et. al, Study of air bubble induced light scattering effect on image quality in 193 nm immersion lithography, Optical Microlithography XVII, Proceedings of SPIE, Vol. 5377 (2004) p 477
9. C.F. Bohren, D.R. Huffman, Absorption and Scattering of Light by Small Particles, John Wiley, New York, 1983
10. Michael I. Mishchenko, Larry D. Travis, Andrew A. Lacis, Scattering, Absorption and Emission of Light by Small Particles, Cambridge University Press, UK, 2002 (currently out of print but available on http://www.giss.nasa.gov/~crmim/books.html)
11. A. Erdmann, C. Kalus, T. Schmöller, Y. Klyonova, T. Sato, A. Endo, T. Shibata, Y. Kobayashi, Rigorous Simulation of Exposure over Non-Planar Wafers, Optical Microlithography XVI, Proceedings of SPIE, Vol. 5040 (2003) p 101
12. P.Monk, Finite Element Methods for Maxwell's Equations, Series: Num.Math.and Scientific Computation, Clarendon-Press, Oxford University Press, 2003.
13. G. Nellis, R. Engelstad, E. Lovell, A. Wei, A. Abdo, J. Chang, A. Diab, S.-Y. Baek, D. Cole, M. Yeung, S. Brueck, A. Neumann, Modeling support for Immersion Lithography, contribution to the ISMT Immersion Lithography Workshop, January 2004, Los Angeles
14. S. Schuetter, D. Rodríguez, T. A. Shedd, G. Nellis, R. Engelstad, Department of Mechanical Engineering, University of Wisconsin-Madison, private communication
15. M. Kocsis, P. De Bisschop, M. Maenhoudt, Y.-C. Kim, G. Wells, S. Light, T. DiBiase, A Methodology for the Characterization of Topography Induced Immersion Bubble Defects, Optical Microlithography XVIII, Proceedings of SPIE, Vol. 5754 (2005)
16. M.S. Yeung, D. Lee, R. Lee, A.R. Neureuther, Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects, Proc. SPIE, Vol. 1927 (1993) p 452
17. A. Erdmann, P. Evanschitzky, P. De Bisschop, Mask and wafer topography effects in immersion lithography, Optical Microlithography XVIII, Proceedings of SPIE, Vol. 5754 (2005)