Probing surface charge potentials of clay basal planes and edges by direct force measurements

Langmuir

Volumn 24, Issue 22, 2008, Pages 12899-12910

  Zhao, Hongying ^a   Bhattacharjee, Subir ^a   Chow, Ross ^b   Wallace, Dean ^c   Masliyah, Jacob H ^a   Xu, Zhenghe ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b ALBERTA RESEARCH COUNCIL   (Canada)

^c Canadian Natural Resources Limited   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHARGED PARTICLES; CLAY MINERALS; COAGULATION; COLLOIDS; CONSUMER PRODUCTS; EVAPORATIVE COOLING SYSTEMS; FLOW INTERACTIONS; FORCE MEASUREMENT; FRICTION; GELATION; MICA; SILICA; SILICATE MINERALS; SURFACE CHARGE; SURFACE POTENTIAL; SURFACE ROUGHNESS; SURFACES;

ANISOTROPIC SURFACES; BASAL PLANES; CEMENT PRODUCTIONS; CHARGE POTENTIALS; CLAY BASAL; CLAY DISPERSIONS; CLAY PARTICLES; CLAY SUSPENSIONS; COLLOIDAL INTERACTIONS; COLLOIDAL PROBE TECHNIQUES; CONTROLLING MECHANISMS; DIRECT FORCE MEASUREMENTS; DLVO FORCES; DLVO THEORIES; EDGE SURFACES; FORCE PROFILES; INTERACTION FORCES; ISOMORPHIC SUBSTITUTIONS; LATTICE ELEMENTS; MATERIALS PROCESSING; MONOTONICALLY; MUSCOVITE MICAS; PERMANENT SURFACE CHARGES; PHYLLOSILICATE CLAYS; POINT OF ZERO CHARGES; PRODUCT FORMULATIONS; SURFACE ELEMENTS;

SURFACE PROPERTIES;

ALUMINUM SILICATE; HYDROXYL RADICAL; MICA; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; CLAY; COLLOID; CONFORMATION; MECHANICAL STRESS; METHODOLOGY; PH; POISSON DISTRIBUTION; SCANNING ELECTRON MICROSCOPY; STATISTICAL MODEL; SURFACE PROPERTY; X RAY DIFFRACTION;

ALUMINUM SILICATES; COLLOIDS; HYDROGEN-ION CONCENTRATION; HYDROXYL RADICAL; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; MODELS, STATISTICAL; MOLECULAR CONFORMATION; POISSON DISTRIBUTION; SILICON DIOXIDE; STRESS, MECHANICAL; SURFACE PROPERTIES; X-RAY DIFFRACTION;

EID: 57349116362     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la802112h     Document Type: Article

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