Optimization of antireflection structures of polymer based on nanoimprinting using anodic porous alumina

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 1856-1859

  Yanagishita, Takashi ^a,b   Kondo, Toshiaki ^b   Nishio, Kazuyuki ^b   Masuda, Hideki ^a  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; OPTIMIZATION; PHOTORESISTS; POLYMERS; REFLECTION;

ANODIC POROUS ALUMINAS; ANTIREFLECTION; ANTIREFLECTION STRUCTURES; FABRICATION PROCESSES; LARGE SAMPLES; ORDERED ARRAYS; POLYMER BASED; POLYMER STRUCTURES;

STRUCTURAL OPTIMIZATION;

EID: 57249111776     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2998731     Document Type: Article

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