Polymer through-hole membrane fabricated by nanoimprinting using metal molds with high aspect ratios

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 4, 2007, Pages

  Yanagishita, Takashi ^a   Nishio, Kazuyuki ^a   Masuda, Hideki ^b  

^a KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHEMICAL STABILITY; MOLDS; NANOSTRUCTURED MATERIALS;

METAL MOLDS; NANOIMPRINTING; REPLICATION PROCESS; TWO LAYER STRUCTURE;

POLYMERIC MEMBRANES;

EID: 34547569072     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2753847     Document Type: Article

References (10)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science 272, 85 (1996).
2. J. Haisma, M. Verheijien, K. Heuvel, and J. Berg, J. Vac. Sci. Technol. B 14, 4124 (1996).
3. M. Komuro, J. Taniguchi, S. Inoue, N. Kimura, Y. Tokano, H. Hiroshima, and S. Matsui, Jpn. J. Appl. Phys., Part 1 39, 7075 (2000).
4. Y. Hirai, S. Harada, H. Kikuta, Y. Tanaka, M. Okano, S. Isaka, and M. Kobayashi, J. Vac. Sci. Technol. B 20, 2867 (2002).
5. S. Nomura, H. Kojima, Y. Ohyabu, K. Kuwabara, A. Miyauchi, and T. Uemura, Jpn. J. Appl. Phys., Part 2 44, L1184 (2005).
6. H. Masuda and K. Fukuda, Science 268, 1466 (1995).
7. H. Masuda, M. Yotsuya, M. Asano, K. Nishio, M. Nakao, A. Yokoo, and T. Tamamura, Appl. Phys. Lett. 78, 826 (2001).
8. J. J. Schneider, J. Engstler, K. P. Budna, C. Teichert, and S. Franzka, Eur. J. Inorg. Chem. 2005, 2352 (2005).
9. T. Yanagishita, K. Nishio, and H. Masuda, Jpn. J. Appl. Phys., Part 2 45, L804 (2006).
10. H. Masuda, H. Yamada, M. Satoh, H. Asoh, M. Nakao, and T. Tamamura, Appl. Phys. Lett. 71, 2770 (1997).