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Applied Physics A: Materials Science and Processing

Volumn 94, Issue 2, 2009, Pages 275-280

Anatase TiO2 films fabricated by pulsed laser deposition using Ti target

(2) Xu, Y a Shen, M R a

a SOOCHOW UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; MICROSTRUCTURE; OXYGEN; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; TITANIUM DIOXIDE; TITANIUM OXIDES;

ANATASE TIO; DEPOSITED FILMS; DEPOSITION PARAMETERS; DIFFERENT SUBSTRATES; GAS AMBIENT; GAS PRESSURES; GRAIN SIZES; OPTICAL-; OXYGEN PRESSURES; PHOTOCATALYTIC PROPERTIES; PULSED LASERS; SUBSTRATE TEMPERATURES;

SUBSTRATES;

EID: 57249083989 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4767-9 Document Type: Article

Times cited : (9)

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