A reactive laser ablation source for the production of thin films

Review of Scientific Instruments

Volumn 69, Issue 8, 1998, Pages 3028-3030

  Rexer, Eric F ^a   Joshi, Mukesh P ^a   DeLeon, Robert L ^a   Prasad, Paras N ^a   Garvey, James F ^a  

^a UNIVERSITY AT BUFFALO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; LASER ABLATION; MOLECULAR BEAMS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SPECTRUM ANALYSIS; STOICHIOMETRY;

LASER ASSISTED MOLECULAR BEAM DEPOSITION; LASER ENTRANCE WINDOW; PULSED LASER DEPOSITION;

THIN FILMS;

EID: 0032132430     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1149064     Document Type: Article

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