|
Volumn 21, Issue 12, 2002, Pages 967-969
|
High-quality epitaxial TiO2 thin films grown on α-Al2O3 substrates by pulsed laser deposition
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ALUMINA;
ATOMIC FORCE MICROSCOPY;
CRYSTAL STRUCTURE;
CRYSTALLINE MATERIALS;
EPITAXIAL GROWTH;
PERMITTIVITY;
PULSED LASER DEPOSITION;
REFRACTIVE INDEX;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SUBSTRATES;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
RUTILE FILMS;
SUBSTRATE TEMPERATURE;
TITANIUM DIOXIDE THIN FILM;
TITANIUM DIOXIDE;
|
EID: 0037098249
PISSN: 02618028
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1016090110315 Document Type: Article |
Times cited : (10)
|
References (12)
|