Strain behavior of lanthanum modified BiFeO3 thin films prepared via soft chemical method

Journal of Applied Physics

Volumn 104, Issue 10, 2008, Pages

  Simes, A Z ^a   Aguiar, E C ^a   Gonzalez, A H M ^a   Andrs J ^b   Longo, E ^a   Varela, J A ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b UNIVERSITAT JAUME I   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SPECTROSCOPY; ELECTRIC PROPERTIES; FERROELECTRIC FILMS; LANTHANUM ALLOYS; PLATINUM; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SOLIDS; THICK FILMS; THIN FILMS;

ATOMIC FORCE MICROSCOPES; ELECTRICAL PROPERTIES; FERROELECTRIC PROPERTIES; PIEZOELECTRIC MEASUREMENTS; PT(111); SET-UPS; SI SUBSTRATES; SOFT CHEMICAL METHODS; STRAIN BEHAVIORS; X-RAY DIFFRACTIONS;

LANTHANUM;

EID: 57049183586     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3029658     Document Type: Article

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