Determination of the twist angle of GaN film by high resolution X-ray diffraction

Applied Physics Express

Volumn 1, Issue 4, 2008, Pages 0450041-0450043

  Li, Hongtao ^a   Luo, Yi ^a   Wang, Lai ^a   Xi, Guangyi ^a   Jiang, Yang ^a   Zhao, Wei ^a   Han, Yanjun ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; FULL WIDTH AT HALF MAXIMUM; GALLIUM ALLOYS; PROBABILITY DENSITY FUNCTION; SEMICONDUCTING GALLIUM; X RAY ANALYSIS; X RAY DIFFRACTION;

AZIMUTHAL SCANS; DISLOCATION DENSITIES; EXPLICIT FUNCTIONS; GAN FILMS; GEOMETRICAL MODELS; HIGH RESOLUTIONS; SCAN DATUMS; TWIST ANGLES; X-RAY DIFFRACTIONS;

GALLIUM NITRIDE;

EID: 57049089513     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.045004     Document Type: Article

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