Synthesis and characterization of nano-sized nitride particles by using an atmospheric microwave plasma technique

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5007-5011

  Bang, Chan Uk ^a   Hong, Yong Cheol ^a   Uhm, Han Sup ^a  

^a Ajou University   (South Korea)

Author keywords

Microwave Plasma; Nanoparticle; Nitride; Si3N4; TiN; VN

Indexed keywords

CHARACTERIZATION; DECOMPOSITION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NITRIDES; PARTICLE SIZE ANALYSIS; SYNTHESIS (CHEMICAL);

ATMOSPHERIC MICROWAVE PLASMA TECHNIQUE; CRYSTALLINITY; GAS-PHASE STARTING MATERIALS;

PLASMA TORCHES;

CHARACTERIZATION; DECOMPOSITION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NITRIDES; PARTICLE SIZE ANALYSIS; PLASMA TORCHES; SYNTHESIS (CHEMICAL);

EID: 33846549970     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.173     Document Type: Article

References (26)

1. Gregoryanz E., Sanloup C., Somayazulu M., Badro J., Fiquet G., Mao H.-K., and Hemley R.J. Nat. Mater. 3 (2004) 294
2. Papaconstantopoulos D.A., Pickett W.E., Klein B.M., and Boyer L.L. Phys. Rev., B 31 (1985) 752
3. Ching W., Mo S., Ouyang L., Rulis P., Tanaka I., and Yoshiya M. J. Am. Ceram. Soc. 85 (2002) 78
4. Dong J., Sankey O.F., Deb S.K., Wolf G., and Mcmillan P.F. Phys. Rev., B 61 (2000) 11979
5. Kroll P. Phys. Rev. Lett. 90 (2003) 125501
6. Ching W.Y., Mo S., Ouyang L., Rulis P., Tanaka I., and Yoshiya M. Phys. Rev., B 61 (2000) 10609
7. Price J.B., Borland J.O., and Selbrede S. Thin Solid Films 236 (1993) 311
8. Winter C.H., Viejo V.C., and Proscia J.W. Mater. Res. Soc. Symp. Proc. 327 (1994) 109
9. In: Oyama S.T. (Ed). The Chemistry of Transition Metal Carbides and Nitrides (1996), Blackie Academic and Professional, London
10. Newport A., Carmalt C.J., Parkin I.P., and O'Neill S.A. Eur. J. Inorg. Chem. 21 (2004) 4286
11. Kim H.Y., Park J.H., and Yang H.I. Chem. Phys. Lett. 372 (2003) 269
12. Matthew D.V. Ceram. Bull. 78 (1999) 69
13. Raghavan N.S., Poste S.D., and Pattemore D. Mater. Sci. Eng., B 19 (1993) 240
14. Nikolaev P., Bronikowski M.J., Bradely R.K., Rohmund F., Colbert D.T., Smith K.A., and Smalley R.E. Chem. Phys. Lett. 313 (1999) 91
15. Lee C.J., Lyu S.C., Kim H.W., Park C.Y., and Yang C.W. Chem. Phys. Lett. 359 (2002) 109
16. Smiljanic O., Stansfield B.L., Dodelet J.P., Serventi A., and Désilets S. Chem. Phys. Lett. 356 (2002) 189
17. Hong Y.C., and Uhm H.S. Phys. Plasmas 12 (2005) 053504
18. Li S.Z., Hong Y.C., Uhm H.S., and Li Z.K. Jpn. J. Appl. Phys. 43 (2004) 7714
19. Oh S.M., and Ishigaki T. Thin Solid Films 457 (2004) 186
20. Lee J.E., Oh S.M., and Park D.W. Thin Solid Films 457 (2004) 230
21. H.S. Uhm, Y.C. Hong, US Patent Application No. 10/765171, Jan. 28 (2004).
22. Hong Y.C., and Uhm H.S. Phys. Plasmas 10 (2003) 3410
23. Kabouzi Y., Calzada M.D., Moisan M., Tran K.C., and Trassy C. J. Appl. Phys. 91 (2002) 1008
24. Jenkins R., and Snyder R.L. In: Winefordner J.K. (Ed). Ch. 3.9.2 Crystallite Size (1996), John Wiley & Sons Inc., New York 89
25. Park H.J., Kim H.E., and Niihara K. J. Am. Ceram. Soc. 80 (1997) 750
26. Sanders W.A., and Mieskowski D.M. J. Am. Ceram. Soc. 64 (1985) 304