Zinc oxide thin film synthesized by combustion chemical vapor deposition

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 2859-2863

  Li, Zhi Yang ^a   Xu, Fuchun ^a   Wu, Qi Hui ^a   Li, Jing ^a  

^a XIAMEN UNIVERSITY   (China)

Author keywords

CCVD; Oxygen vacancies; ZnO thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMBUSTION; CRYSTAL STRUCTURE; FILM PREPARATION; II-VI SEMICONDUCTORS; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; OXYGEN VACANCIES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE REACTIONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE; ZINC SULFIDE;

CCVD; CHEMICAL STOICHIOMETRY; COMBUSTION CHEMICAL VAPOR DEPOSITION; HEXAGONAL WURTZITE; RAMAN SPECTROSCOPIC; ZINC OXIDE (ZNO); ZINC OXIDE THIN FILMS; ZNO THIN FILM;

THIN FILMS;

EID: 56949092248     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.08.027     Document Type: Article

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