-
1
-
-
25144462707
-
-
Özgür, Ü.; Alivov, Ya. I.; Liu, C.; Teke, A.; Reshchikov, M. A.; Doǧan; Avrutin, S. V.; Cho, S.-J.; Morkoç, H. J. Appl. Phys. 2005, 98, 041301.
-
Özgür, Ü.; Alivov, Ya. I.; Liu, C.; Teke, A.; Reshchikov, M. A.; Doǧan; Avrutin, S. V.; Cho, S.-J.; Morkoç, H. J. Appl. Phys. 2005, 98, 041301.
-
-
-
-
2
-
-
2342529638
-
-
Ashrafi, A. B. M.; Zhang, B.; Ninh, N.; Wakatsuki, K.; Segawa, Y. Jpn. J. Appl. Phys. 2004, 43, 1114.
-
(2004)
Jpn. J. Appl. Phys
, vol.43
, pp. 1114
-
-
Ashrafi, A.B.M.1
Zhang, B.2
Ninh, N.3
Wakatsuki, K.4
Segawa, Y.5
-
3
-
-
0035410851
-
-
Chen, M.; Pei, Z.; Wang, X.; Sun, C.; Wen, L. J. Mater. Res. 2001, 16(7), 2118.
-
(2001)
J. Mater. Res
, vol.16
, Issue.7
, pp. 2118
-
-
Chen, M.1
Pei, Z.2
Wang, X.3
Sun, C.4
Wen, L.5
-
5
-
-
33748912501
-
-
Suchea, M.; Christoulakis, S.; Moschovis, K.; Katsarakis, N.; Kiriakidis, G. Thin Solid Films 2006, 515, 551.
-
(2006)
Thin Solid Films
, vol.515
, pp. 551
-
-
Suchea, M.1
Christoulakis, S.2
Moschovis, K.3
Katsarakis, N.4
Kiriakidis, G.5
-
8
-
-
33144465032
-
-
Liu, C.; Li, H.; Jie, W.; Zhang, X.; Yu, D. Mater. Lett. 2006, 60, 1394.
-
(2006)
Mater. Lett
, vol.60
, pp. 1394
-
-
Liu, C.1
Li, H.2
Jie, W.3
Zhang, X.4
Yu, D.5
-
9
-
-
33748972797
-
-
Hu, H.; Yu, K.; Zhu, J. Zhu, Z. Appl. Surf. Sci. 2006, 252, 8410.
-
(2006)
Appl. Surf. Sci
, vol.252
, pp. 8410
-
-
Hu, H.1
Yu, K.2
Zhu, J.3
Zhu, Z.4
-
10
-
-
29844453466
-
-
Amekura, H.; Umeda, N.; Yoshitake, M. Kono, K.; Kishmoto, N.; Buchal, Ch. J. Cryst. Growth 2006, 287, 2.
-
(2006)
J. Cryst. Growth
, vol.287
, pp. 2
-
-
Amekura, H.1
Umeda, N.2
Yoshitake, M.3
Kono, K.4
Kishmoto, N.5
Buchal, C.6
-
11
-
-
0031549552
-
-
Chen, Y.; Bagnall, D. M.; Zhu, Z.; Sekiuchi, T.; Park, K-t.; Hiraga, K.; Yao, T.; Koyama, S.; Shen, M.Y.; Goto, T. J. Cryst. Growth 1997, 181, 165.
-
(1997)
J. Cryst. Growth
, vol.181
, pp. 165
-
-
Chen, Y.1
Bagnall, D.M.2
Zhu, Z.3
Sekiuchi, T.4
Park, K.-T.5
Hiraga, K.6
Yao, T.7
Koyama, S.8
Shen, M.Y.9
Goto, T.10
-
12
-
-
0036160419
-
-
Li, B. S.; Liu, Y. C.; Shen, D. Z.; Lu, Y. M.; Zhang, J. Y.; Kong, X. G.; Fan, X. W.; Zhi, Z. Z. J. Vac. Sci. Technol, A 2002, 20, 265.
-
(2002)
J. Vac. Sci. Technol, A
, vol.20
, pp. 265
-
-
Li, B.S.1
Liu, Y.C.2
Shen, D.Z.3
Lu, Y.M.4
Zhang, J.Y.5
Kong, X.G.6
Fan, X.W.7
Zhi, Z.Z.8
-
13
-
-
0041430950
-
-
Wang, Y. G.; Lau, S. P.; Lee, H. W.; Yu, S. F.; Tay, B. K.; Zhang, X. H.; Tse, K. Y. Hng, H. H. J. Appl. Phys. 2003, 94, 1597.
-
(2003)
J. Appl. Phys
, vol.94
, pp. 1597
-
-
Wang, Y.G.1
Lau, S.P.2
Lee, H.W.3
Yu, S.F.4
Tay, B.K.5
Zhang, X.H.6
Tse, K.Y.7
Hng, H.H.8
-
14
-
-
32644436413
-
-
Villanueva, Y. Y.; Liu, D.-R., Cheng, P. T. Thin Solid Films 2006, 501, 366.
-
(2006)
Thin Solid Films
, vol.501
, pp. 366
-
-
Villanueva, Y.Y.1
Liu, D.-R.2
Cheng, P.T.3
-
15
-
-
33646345623
-
-
Liu, Y.; Liu, Y.; Zhang, J.; Lu, Y.; Shen, D.; Fan, X. J. Cryst. Growth 2006, 290, 405.
-
(2006)
J. Cryst. Growth
, vol.290
, pp. 405
-
-
Liu, Y.1
Liu, Y.2
Zhang, J.3
Lu, Y.4
Shen, D.5
Fan, X.6
-
16
-
-
0142009447
-
-
Wong, M. H.; Berenov, A.; Qi, X.; Kappers, M. J.; Barber, Z. H.; Illy, B.; Lockman, Z.; Ryan, M. P.; MacManus-Driscoll, J. L. Nanotechnology 2003, 14, 968.
-
(2003)
Nanotechnology
, vol.14
, pp. 968
-
-
Wong, M.H.1
Berenov, A.2
Qi, X.3
Kappers, M.J.4
Barber, Z.H.5
Illy, B.6
Lockman, Z.7
Ryan, M.P.8
MacManus-Driscoll, J.L.9
-
17
-
-
34047120196
-
-
Tang, Y.; Luo, L.; Chen, Z.; Jiang, Y.; Li, B.; Jia, Z.; Xu, L. Electrochem. Commun. 2007, 9, 289.
-
(2007)
Electrochem. Commun
, vol.9
, pp. 289
-
-
Tang, Y.1
Luo, L.2
Chen, Z.3
Jiang, Y.4
Li, B.5
Jia, Z.6
Xu, L.7
-
18
-
-
0003472630
-
-
Vashishta, P, Mundym, J. N, Shenoy, G. K, Eds, North-Holland: New York
-
Armond, M. B.; Chabagno, J. M.; Duclot, M. In Fast Ion Transport in Solids; Vashishta, P., Mundym, J. N., Shenoy, G. K., Eds.; North-Holland: New York, 1979.
-
(1979)
Fast Ion Transport in Solids
-
-
Armond, M.B.1
Chabagno, J.M.2
Duclot, M.3
-
19
-
-
0000608627
-
-
Sugai, T.; Omote, H.; Bandow, S.; Takana, N.; Shinohara, H. J. Chem. Phys. 2000, 112, 6000.
-
(2000)
J. Chem. Phys
, vol.112
, pp. 6000
-
-
Sugai, T.1
Omote, H.2
Bandow, S.3
Takana, N.4
Shinohara, H.5
-
20
-
-
37249092818
-
-
DeLeon R. L.; Joshi, M. P.; Rexer, E. F.; Prasad, P. N.; Garvey, J. F. Appl. Surf. Sci. 1998, 321, 127.
-
(1998)
Appl. Surf. Sci
, vol.321
, pp. 127
-
-
DeLeon, R.L.1
Joshi, M.P.2
Rexer, E.F.3
Prasad, P.N.4
Garvey, J.F.5
-
21
-
-
0032132430
-
-
Rexer, E. F.; Joshi, M. P.; DeLeon, R. L.; Prasad, P. N.; Garvey, J. F. Rev. Sci. Instrum. 1998, 69, 3028.
-
(1998)
Rev. Sci. Instrum
, vol.69
, pp. 3028
-
-
Rexer, E.F.1
Joshi, M.P.2
DeLeon, R.L.3
Prasad, P.N.4
Garvey, J.F.5
-
22
-
-
0032620609
-
-
Joshi, M. P.; DeLeon, R. L.; Prasad, P. N.; Garvey J. F. J. Appl. Phys. Lett. 1998, 85, 3928.
-
(1998)
J. Appl. Phys. Lett
, vol.85
, pp. 3928
-
-
Joshi, M.P.1
DeLeon, R.L.2
Prasad, P.N.3
Garvey, J.F.4
-
23
-
-
0038656258
-
-
Rexer, E. F.; Wilbur D. B.; DeLeon R. L.; Mills J. L.; Garvey, J. F. Rev. Sci. Instrum. 2000, 71, 2125.
-
(2000)
Rev. Sci. Instrum
, vol.71
, pp. 2125
-
-
Rexer, E.F.1
Wilbur, D.B.2
DeLeon, R.L.3
Mills, J.L.4
Garvey, J.F.5
-
24
-
-
0001721344
-
-
Siekmann, H. R.; Lüder, C.; Faehrmann, J.; Lutz, H. O.; Meiwes-Broer, K. H. Z. Phys. D 1991, 20, 417.
-
(1991)
Z. Phys. D
, vol.20
, pp. 417
-
-
Siekmann, H.R.1
Lüder, C.2
Faehrmann, J.3
Lutz, H.O.4
Meiwes-Broer, K.H.5
-
25
-
-
0003400233
-
-
Scoles, G, Ed, Oxford University Press: New York
-
Ploog, K. In Atomic and Molecular Beam Methods; Scoles, G.; Ed.; Oxford University Press: New York, 1988.
-
(1988)
Atomic and Molecular Beam Methods
-
-
Ploog, K.1
-
26
-
-
37249088726
-
-
Yamada, I. In Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions; Rossnagel, S. M., Cuomo, J. J., Westwood, W. D, Eds.; Noyes Publications: Westwood, NJ, 1990.
-
Yamada, I. In Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions; Rossnagel, S. M., Cuomo, J. J., Westwood, W. D, Eds.; Noyes Publications: Westwood, NJ, 1990.
-
-
-
-
28
-
-
0004029498
-
-
Boxman, R. L, Sanders, D. M, Martin, P. J, Eds, Noyes Publications: ParkRidge, NJ
-
Farrall, G. A. In Handbook of Vacuum Arc Science and Technology Fundamentals and Applications; Boxman, R. L., Sanders, D. M., Martin, P. J., Eds.; Noyes Publications: ParkRidge, NJ, 1995.
-
(1995)
Handbook of Vacuum Arc Science and Technology Fundamentals and Applications
-
-
Farrall, G.A.1
-
29
-
-
0004029498
-
-
Boxman, R. L, Sanders, D. M, Martin, P. J, Eds, Noyes Publications: ParkRidge, NJ
-
Hantzsche, E. In Handbook of Vacuum Arc Science and Technology Fundamentals and Applications; Boxman, R. L., Sanders, D. M., Martin, P. J., Eds.; Noyes Publications: ParkRidge, NJ, 1995.
-
(1995)
Handbook of Vacuum Arc Science and Technology Fundamentals and Applications
-
-
Hantzsche, E.1
-
31
-
-
0004029498
-
-
Boxman, R. L, Sanders, D. M, Martin, P. J, Eds, Noyes Publications: ParkRidge, NJ
-
Miller, H. C. In Handbook of Vacuum Arc Science and Technology Fundamentals and Applications; Boxman, R. L., Sanders, D. M., Martin, P. J., Eds.; Noyes Publications: ParkRidge, NJ, 1995.
-
(1995)
Handbook of Vacuum Arc Science and Technology Fundamentals and Applications
-
-
Miller, H.C.1
-
32
-
-
0034502862
-
-
Takikawa, H.; Kimura, K.; Miyano, R.; Sakakibara, T. Thin Solid Films 2000, 377, 74.
-
(2000)
Thin Solid Films
, vol.377
, pp. 74
-
-
Takikawa, H.1
Kimura, K.2
Miyano, R.3
Sakakibara, T.4
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