Phase separated AlSi thin films prepared by filtered cathodic arc deposition

Thin Solid Films

Volumn 517, Issue 5, 2009, Pages 1567-1571

  Saito, T ^a   Horie, R ^a   Den, T ^a   Bendavid, A ^b   Preston, E ^b   Martin, P J ^b  

^a CANON INC   (Japan)

^b CSIRO   (Australia)

Author keywords

Aluminium; Nanostructures; Phase transition; Physical vapor deposition; Scanning electron microscopy; Silicon

Indexed keywords

ALUMINUM; AMORPHOUS FILMS; AMORPHOUS SILICON; CAVITY RESONATORS; CONDUCTIVE FILMS; CYLINDERS (SHAPES); DEPOSITION; FILM PREPARATION; PHASE TRANSITIONS; SCANNING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS;

ALUMINIUM; AMMONIA SOLUTIONS; AMORPHOUS SI; AVERAGE DIAMETERS; CATHODE COMPOSITIONS; COMPOSITIONAL DEPENDENCES; FILM MORPHOLOGIES; FILTERED CATHODIC ARC DEPOSITIONS; NEGATIVE SUBSTRATE BIASES; ORDERED ARRANGEMENTS; POROUS STRUCTURES; SCANNING ELECTRON MICROSCOPES; SI SUBSTRATES; SPUTTERING PROCESSES; SUBSTRATE BIASES; SUBSTRATE TEMPERATURES;

SUBSTRATES;

EID: 56949091059     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.09.046     Document Type: Article

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