Substrate bias effect on Al-Si and Al-Ge thin film structure

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8315-8318

  Horie, Ryoko ^a   Yasui, Nobuhiro ^a   Ohashi, Yoshihiro ^a   Den, Tohru ^a  

^a CANON INC   (Japan)

Author keywords

Al Ge; Al Si; Aluminium; Germanium; Nanostructures; Phase separation; Silicon; Sputtering; Substrate bias

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; AMORPHOUS SILICON; BIAS VOLTAGE; CYLINDERS (SHAPES); GERMANIUM; SILICON; SUBSTRATES; THICK FILMS; TRANSMISSION ELECTRON MICROSCOPY;

AL-GE; AL-SI; ALUMINIUM; AMORPHOUS SI; GE FILMS; LOW AREA; NANOSTRUCTURES; NEGATIVE BIAS; PHASE SEPARATION; SIMULATION RESULTS; SPUTTERING; SPUTTERING METHODS; SUBSTRATE BIAS; SUBSTRATE BIAS VOLTAGE; SUBSTRATE BIASING; THIN-FILM STRUCTURES; TRANSMISSION ELECTRON MICROSCOPE;

ALUMINUM;

EID: 50849119407     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.03.036     Document Type: Article

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