Stochastic fitting of specular X-ray reflectivity data using StochFit

Journal of Applied Crystallography

Volumn 41, Issue 6, 2008, Pages 1187-1193

  Danauskas, Stephen M ^a   Li, Dongxu ^b   Meron, Mati ^b   Lin, Binhua ^b   Lee, Ka Yee C ^a  

^a UNIVERSITY OF CHICAGO   (United States)

^b UNIVERSITY OF CHICAGO   (United States)

Author keywords

Computer programs; Electron density distribution; Interfaces; Specular X ray reflectivity; StochFit; Thin films

Indexed keywords

EID: 56549103100     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S0021889808032445     Document Type: Article

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