Cesium near-surface concentration in low energy, negative mode dynamic SIMS

Applied Surface Science

Volumn 255, Issue 4, 2008, Pages 1316-1319

  Berghmans, B ^a,b   Van Daele, B ^b   Geenen, L ^b   Conard, T ^b   Franquet, A ^b   Vandervorst, W ^a,b  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b IMEC   (Belgium)

Author keywords

Cesium; Silicon; SIMS; Sputtering; Ultra low energy

Indexed keywords

DEPTH PROFILING; IONS; SECONDARY ION MASS SPECTROMETRY; SILICON; SPUTTERING;

DEPTH RESOLUTION; EXTREME CONDITIONS; MODE DYNAMICS; RETENTION MODELS; SECONDARY IONS; SPUTTERING YIELDS; STEADY-STATE SURFACES; ULTRA LOW ENERGY;

CESIUM;

EID: 56449103933     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.020     Document Type: Article

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