Quantitative fundamental SIMS studies using 18 O implant standards

Applied Surface Science

Volumn 252, Issue 19, 2006, Pages 6429-6432

  Williams, Peter ^a   Sobers Jr , Richard C ^a   Franzreb, Klaus ^a   Lörinčík, Jan ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

Implant standard; Oxygen; Segregation; Sputter yield; Useful ion yield

Indexed keywords

CHEMICAL ANALYSIS; ISOTOPES; OXYGEN; SEGREGATION (METALLOGRAPHY); SPUTTERING; SURFACE PHENOMENA;

IMPLANT STANDARD; METAL OVERLAYERS; SPUTTER YIELD; USEFUL ION YIELD;

SECONDARY ION MASS SPECTROMETRY;

EID: 33747154143     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.091     Document Type: Article

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