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Volumn 47-50 PART 1, Issue , 2008, Pages 549-553
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Effects of temperature on microstructure and tribological performance of a-CNx films prepared by pulsed laser deposition
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Author keywords
Carbon nitride film; Friction and wear; Pulsed laser deposition
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Indexed keywords
AMORPHOUS CARBON;
CARBON FILMS;
CARBON NITRIDE;
DEPOSITION;
EXCIMER LASERS;
FRICTION;
GAS LASERS;
KRYPTON;
LASERS;
MATERIALS SCIENCE;
MICROSCOPIC EXAMINATION;
MICROSTRUCTURE;
NITRIDES;
PHOTOELECTRON SPECTROSCOPY;
POLYCRYSTALLINE MATERIALS;
PULSED LASER APPLICATIONS;
PULSED LASER DEPOSITION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SILICON WAFERS;
WEAR RESISTANCE;
X RAY PHOTOELECTRON SPECTROSCOPY;
AMORPHOUS FILMS;
FUNCTIONAL MATERIALS;
SCANNING ELECTRON MICROSCOPY;
TEMPERATURE;
TRIBOLOGY;
AMORPHOUS CARBON FILMS;
CARBON NITRIDE FILM;
DEGREE OF ORDERS;
DEPOSITION TEMPERATURES;
EFFECTS OF TEMPERATURES;
FRICTION AND WEAR;
FRICTION COEFFICIENTS;
HUMID AIRS;
KRF EXCIMER LASERS;
LOW FRICTION COEFFICIENTS;
N CONTENTS;
PHOTOELECTRON SPECTRUMS;
PULSED LASERS;
RAMAN SPECTRUMS;
TRIBOLOGICAL PERFORMANCES;
TRIBOMETER;
CARBON NITRIDE FILMS;
EFFECTS OF TEMPERATURE;
TRIBOLOGICAL PERFORMANCE;
X RAY PHOTOELECTRON SPECTRA;
TRIBOLOGY;
PULSED LASERS;
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EID: 56349125596
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: None Document Type: Conference Paper |
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Times cited : (1)
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References (9)
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