Nanostructured columnlike tungsten oxide film by anodizing Al/W/Ti layers on Si

Chemistry of Materials

Volumn 20, Issue 20, 2008, Pages 6482-6493

  Mozalev, Alexander ^a   Khatko, Viacheslav ^b   Bittencourt, Carla ^c   Hassel, Achim Walter ^d   Gorokh, Gennadii ^a   Llobet, Eduard ^b   Correig, Xavier ^b  

^a BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

^b UNIVERSITAT ROVIRA I VIRGILI   (Spain)

^c UNIVERSITY OF MONS   (Belgium)

^d MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS MATERIALS; ANNEALING; DISSOLUTION; MANGANESE COMPOUNDS; OXIDE FILMS; OXIDES; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SPUTTER DEPOSITION; TITANIUM; TITANIUM OXIDES; TUNGSTEN; TUNGSTEN COMPOUNDS;

ACID ELECTROLYTES; AL LAYERS; ALUMINA MATRIXES; ALUMINA PORES; CATION VACANCIES; IONIC TRANSPORT PROCESSES; MINOR COMPONENTS; NANOPOROUS ALUMINUM OXIDES; NANOSTRUCTURED; POLYCRYSTALLINE PHASIS; REANODIZING; SELECTIVE DISSOLUTIONS; SIMULTANEOUS GROWTHS; SURFACE LAYERS; TRANSPORT NUMBERS; TRILAYER; TUNGSTEN OXIDE FILMS; TUNGSTEN OXIDES; TUNGSTEN SPECIES;

ALUMINA;

EID: 55849136196     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm801481z     Document Type: Article

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