Anodic film growth on Al layers and Ta-Al metal bilayers in citric acid electrolytes

Electrochimica Acta

Volumn 50, Issue 25-26 SPEC. ISS., 2005, Pages 5065-5075

  Mozalev, A ^a   Mozaleva, I ^a   Sakairi, M ^b   Takahashi, H ^b  

^a BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Citric acid electrolyte; Dielectric properties; High voltage reanodising; Porous anodic alumina; Ta Al metal bilayer

Indexed keywords

ALUMINA; ALUMINUM; DIELECTRIC PROPERTIES; ELECTRIC POTENTIAL; ELECTROLYTES; MULTILAYERS; POROUS MATERIALS;

CITRIC ACID ELECTROLYTE; HIGH-VOLTAGE REANODISING; POROUS ANODIC ALUMINA; TA-AL METAL BILAYERS;

FILM GROWTH;

EID: 24344507231     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.02.092     Document Type: Conference Paper

References (28)

1. R. Jia, Y. Shen, H. Luo, X. Chen, Z. Hu, and D. Xue Appl. Surf. Sci. 233 2004 343
2. R.P. Jia, Y. Shen, H.Q. Luo, X.G. Chen, Z.D. Hu, and D.S. Xue Solid-State Commun. 130 2004 367
3. A.V. Kukhta, G.G. Gorokh, E.E. Kolesnik, A.I. Mitkovets, M.I. Taoubi, Yu.A. Koshin, and A.M. Mozalev Surf. Sci. 507 2002 593
4. E.C. Dickey, O.K. Varghese, K.G. Ong, D. Gong, M. Paulose, and C.A. Grimes Sensors 2 2002 91
5. A. Mozalev, A. Surganov, and S. Magaino Electrochim. Acta 44 1999 3891
6. M. Shikanai, M. Sakairi, H. Takahashi, M. Seo, K. Takahiro, S. Nagata, and S. Yamaguchi J. Electrochem. Soc. 144 1997 2756
7. J.P. O'Sullivan, and G.C. Wood Proc. R. Soc. Lond. A317 1970 511
8. H. Masuda, K. Yada, and A. Osaka Jpn. J. Appl. Phys. 37 1998 L1340
9. V. Surganov, P. Morgen, J.C. Nielsen, G. Gorokh, and A. Mozalev Electrochim. Acta 23 1987 1125
10. V. Surganov, G. Gorokh, A. Poznyak, and A. Mozalev Russ. J. Appl. Chem. 61 1988 2011
11. V. Surganov, and G. Gorokh Mater. Lett. 17 1993 121
12. V. Surganov, and G. Gorokh Russ. J. Appl. Chem. 66 1993 683
13. A. Mozalev, and I. Mozaleva Ext. Abst. 49th Annual Meeting International Society of Electrochemistry Kitakyushu, Japan, 13-19 September 1998 135
14. V. Surganov, and G. Gorokh Elektrokhimiya 30 1994 110
15. S. Ono, M. Saito, M. Ishiguro, and H. Asoh Electrochem. Soc. 151 2004 B473
16. A. Mozalev, M. Sakairi, and H. Takahashi J. Electrochem. Soc. 151 2004 F257
17. A. Mozalev Proceedings of 11th Electronic Devices and Systems Conference (EDS 2004) Brno, Czech Republic, 9-10 September 2004 243
18. K. Shimizu, G.E. Thompson, G.C. Wood, Y. Kurima, and K. Kobayashi Thin Solid Films 173 1989 263
19. G.C. Wood J.W. Diggle Oxides and Oxide Films vol. 2 1987 Marcell Dekker New York 41
20. M. Nagayama, H. Takahashi, and K. Fujimoto Application of Complex Plane Analysis to Electrochemistry 1982 USA Office of The Electrochemical Society of Japan Cleveland, OH 1
21. A. Mozalev, M. Sakairi, I. Saeki, and H. Takahashi Electrochim. Acta 48 2003 3155
22. H. Habazaki, P. Skeldon, G.E. Thompson, and G.C. Wood Philos. Mag. B 71 1995 81
23. Q. Lu, P. Skeldon, G.E. Thompson, D. Masheder, H. Habazaki, and K. Shimizu Corros. Sci. 46 2004 2817
24. I. Vrublevsky, V. Parkoun, V. Sokol, and J. Schreckenbach Appl. Surf. Sci. 236 2004 270
25. J.P.S. Pringle Electrochim. Acta 25 1980 1423
26. J. De Laet, H. Terryn, and J. Vereecken Electrochim. Acta 41 1995 1155
27. J.C.S. Fernandes, R. Picciochi, M. Da Cunha Belo, T. Moura e Silva, M.G.S. Ferreira, and I.T.E. Fonseca Electrochim. Acta 49 2004 4701
28. V.V. Gruzinskii, A.V. Kukhto, A.M. Mozalev, and V.F. Surganov J. Appl. Spectrosc. 64 1997 483