Changes in atomic and electronic structures of amorphous WO3 films due to electrochemical ion insertion

Thin Solid Films

Volumn 445, Issue 2, 2003, Pages 175-181

  Nanba, T ^a   Ishikawa, M ^a   Sakai, Y ^a   Miura, Y ^a  

^a OKAYAMA UNIVERSITY   (Japan)

Author keywords

Molecular orbital calculation; Structure; Tungsten trioxide; X ray photoelectron spectroscopy

Indexed keywords

BOND STRENGTH (CHEMICAL); BONDING; DECOMPOSITION; ELECTROCHEMISTRY; ELECTRONIC STRUCTURE; PHASE TRANSITIONS; SPECTRUM ANALYSIS; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLECULAR ORBITAL CALCULATIONS; TUNGSTEN TRIOXIDE;

THIN FILMS;

EID: 1642289846     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01188-X     Document Type: Conference Paper

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