Microstructure and mechanical properties of (Ti,Al)(O,N) films synthesized by reactive sputtering

Materials Letters

Volumn 60, Issue 3, 2006, Pages 375-378

  Mei, Fanghua ^a   Dong, Yunshan ^a   Li, Yirui ^a   Li, Geyang ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

(Ti,Al)(O,N) film; Mechanical property; Microstructure; Reactive sputtering

Indexed keywords

ALUMINUM COMPOUNDS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

(TI,AL)(O,N) FILM; NANOINDENTATION; REACTIVE SPUTTERING; STOICHIOMETRIC CONSTANTS;

THIN FILMS;

EID: 27844544660     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.08.063     Document Type: Article

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