Chromium and titanium film deposition using a hot refractory anode vacuum arc plasma source

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 501-504

  Beilis, I I ^a   Shnaiderman, A ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Chromium film; Deposition rate; Macroparticle; Refractory anode; Titanium film; Vacuum arc

Indexed keywords

CAVITY RESONATORS; CHROMIUM; DEPOSITION; DEPOSITION RATES; GLASS; OPTICAL MICROSCOPY; PLASMA DEPOSITION; PLASMA SOURCES; PLASMAS; REFRACTORY MATERIALS; SUBSTRATES; THICK FILMS; TITANIUM; TUNGSTEN; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

CHROMIUM FILM; MACROPARTICLE; REFRACTORY ANODE; TITANIUM FILM; VACUUM ARC;

VACUUM DEPOSITION;

EID: 55749106050     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.168     Document Type: Article

References (10)

1. In: Boxman R.L., Martin P., and Sanders D. (Eds). Handbook of Vacuum Arc Science and Technology (1995), Noyes Publishing, Ridge Park NJ
2. Martin P.J., and Bendavid A. Thin Solid Films 394 (2001) 1
3. Ehrich H., Hasse B., Muller K.G., and Schimidt R. J. Vac. Technol. vol. A 6 4 (Jan/Feb 1988) 2499-2503
4. Beilis I.I., Goldsmith S., and Boxman R.L. Phys. Plasmas 9 N7 (2002) 3159
5. Beilis I.I., Goldsmith S., and Boxman R.L. Surf. Coat. Technol. 133-134 (2000) 91
6. Rosenthal H., Beilis I.I., Goldsmith S., and Boxman R.L. J. Phys. D: Appl. Phys. 28 (1995) 353
7. Beilis I.I., Shashurin A., Arbilly D., Boxman R.L., and Goldsmith S. Surf. Coat. Technol. 177-178 (2004) 233
8. Beilis I.I., Shashurin A., Nemirovsky A., Goldsmith S., and Boxman R.L. Plasma Sci. 33 (2005) 1641
9. Beilis I.I., Shnaiderman A., Shashurin A., Boxman R.L., and Goldsmith S. Surf. Coat. Technol. 202 (2007) 925
10. Shashurin A., Beilis I.I., Sivan Y., Goldsmith S., and Boxman R.L. Surf. and Coat. Technol. 201 N7 (2006) 4145