Hot refractory anode vacuum arc: A new plasma source for metallic film deposition

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 91-95

  Beilis, I I ^a   Goldsmith, S ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CATHODES; COPPER; DENSITY (SPECIFIC GRAVITY); ELECTRIC ACCIDENTS; GLASS; METALLIC FILMS; OPTICAL MICROSCOPY; PARTICLES (PARTICULATE MATTER); PLASMA SOURCES; STAINLESS STEEL; VACUUM APPLICATIONS;

HOT REFRACTORY ANODE VACUUM ARC (HRAVA) DEPOSITION;

COATING TECHNIQUES;

CATHODIC ARC PLASMA DEPOSITION;

EID: 0034511360     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00880-X     Document Type: Article

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