Growth of Ga-doped ZnO films with ZnO buffer layer by sputtering at room temperature

Superlattices and Microstructures

Volumn 44, Issue 6, 2008, Pages 742-753

  Chen, Ding Yeng ^a   Hsu, Chun Yao ^b  

^a HWA HSIA INSTITUTE OF TECHNOLOGY   (Taiwan)

^b LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Buffer layer; Grey relational; Transparent conductive oxide; Zinc oxide

Indexed keywords

ABS RESINS; BUFFER LAYERS; CHEMICAL VAPOR DEPOSITION; COATINGS; DEPOSITION; ELECTRIC RESISTANCE; EPITAXIAL LAYERS; GALLIUM; GALLIUM ALLOYS; MAGNETRON SPUTTERING; OPACITY; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; OPTOELECTRONIC DEVICES; OXIDES; POLYMERIC GLASS; SEMICONDUCTING ZINC COMPOUNDS; TAGUCHI METHODS; ZINC; ZINC ALLOYS; ZINC OXIDE;

COATING PARAMETERS; COATING PROCESSES; DEPOSITION TIMES; ELECTRICAL RESISTIVITIES; FILM DEPOSITIONS; GLASS SUBSTRATES; GREY RELATIONAL; METHOD ANALYSES; OPTICAL TRANSMITTANCES; PERFORMANCE CHARACTERISTICS; PERFORMANCE INDICES; POLYMERIC SUBSTRATES; R.F. MAGNETRON SPUTTERING; RATE RATIOS; RELATIONAL GRADES; ROOM TEMPERATURE DEPOSITIONS; ROOM TEMPERATURES; SPUTTERING PRESSURES; TAGUCHI; TRANSPARENT CONDUCTIVE OXIDE; ZINC OXIDE FILMS; ZNO BUFFER LAYERS; ZNO FILMS;

OXIDE FILMS;

EID: 55649110475     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2008.08.001     Document Type: Article

References (29)

1. Jin B.J., Bae S.H., Lee S.Y., and Im S. Mater. Sci. Eng. B 71 (2000) 301
2. Park G.S., and Yang G.M. Thin Solid Films 365 (2000) 7
3. Bang K.H., Hwang D.K., and Myoung J.M. Appl. Surf. Sci. 207 (2003) 359
4. Koa H., Taib W.P., Kimc K.C., Kimc S.H., Suha S.J., and Kima Y.S. J. Crystal Growth 277 (2005) 352
5. Shukla R.K., Srivastava A., Srivastava A., and Dubey K.C. J. Crystal Growth 294 (2006) 427
6. Song P.K., Watanabe M., Kon M., Mitsui A., and Shigesato Y. Thin Solid Films 411 (2002) 82
7. Cheong K.Y., Muti N., and Ramanan S.R. Thin Solid Films 410 (2002) 142
8. Choi B.H., Im H.B., Song J.S., and Yoom K.H. Thin Solid Films 193-194 (1990) 712
9. Hu J., and Gordon R.G. J. Appl. Phys. 72 (1992) 5381
10. Cheong Y., Muti N., and Ramanan S.R. Thin Solid Films 410 (2002) 142
11. Hirata G.A., McKittrick J., Cheeks T., Siqueiros J.M., Diaz J.A., Contreras O., and Lopez O.A. Thin Solid Films 288 (1996) 29
12. Zhang Y., Zheng H., Su J., Lin B., and Fu Z. J. Luminescence 124 (2007) 252
13. Yamamoto T., Sakemi T., Wai K.A., and Shirakata S. Thin Solid Films 451 (2004) 439
14. Nakamura T., Yamada Y., Kusumori T., Minoura H., and Muto H. Thin Solid Films 411 (2002) 60
15. Fortunato E., Goncalves A., Assuncao V., Marques A., Aguas H., Pereira L., Ferreira I., and Martins R. Thin Solid Films 442 (2003) 121
16. Hsu C.Y., and Tsang C.H. Sol. Energy Mater. Sol. Cells 92 (2008) 530
17. Tsao C.C., and Hocheng H. Int. J. Machine Tools Manufacture 44 (2004) 1085
18. Nalbant M., Gokkaya H., and Sur G. Mater. Design 28 (2007) 1379
19. Deng J.L. Introduction to grey system. J. Grey Syst. 1 1 (1989) 1
20. Tarng Y.S., Juang S.C., and Chang C.H. J. Mater. Process. Technol. 128 (2002) 1
21. Kuo H.H., Wu J.H., and Chin J. J. Grey Syst. 1 (1998) 47
22. Wu J.H., and Chen C.B. J. Grey Syst. 11 (1999) 7
23. Fung C.P. Wear 254 (2003) 298
24. Lin J.L., and Lin C.L. Int. J. Machine Tools Manufacture 42 (2002) 237
25. Hsu C.Y., Huang C.K., and Wu C.Y. Int. J. Adv. Manuf. Technol. 34 (2007) 857
26. Assuncao V., Fortunato E., Marques A., Aguas H., Ferreira I., Costa M.E.V., and Martins R. Thin Solid Films 427 (2003) 401
27. Yu X., Ma J., Ji F., Wang Y., Zhang X., Cheng C., and Ma H. Appl. Surf. Sci. 239 (2005) 222
28. Yi C.H., Yasui I., and Shigesato Y. Jpn. J. Appl. Phys. 34 (1995) 1639
29. Sun X.W., Wang L.D., and Kwok H.S. Thin Solid Films 360 (2000) 75