Optical properties and laser-induced damage threshold of Ta2O5 films deposited by different methods

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 35, Issue 10, 2008, Pages 1595-1599

  Xu, Cheng ^a,b   Dong, Hongcheng ^a,b   Xiao, Qiling ^a,b   Ma, Jianyong ^a,b   Jin, Yunxia ^a   Shao, Jianda ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Absorption; Annealing; Laser induced damage threshold; Thin films

Indexed keywords

ABSORPTION; ANNEALING; EVAPORATION; FILM PREPARATION; ION BEAMS; OPTICAL PROPERTIES; SPUTTERING; TANTALUM OXIDES; THIN FILMS;

ELECTRON BEAM EVAPORATION; HIGH PURITY; IMPURITY CONTENT; ION-BEAM SPUTTERING; LASER INDUCED DAMAGE THRESHOLDS; MICRODEFECT DENSITY; RMS ROUGHNESS; ROOT MEAN SQUARE ROUGHNESS;

LASER DAMAGE;

EID: 55649097540     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: 10.3788/cjl20083510.1595     Document Type: Article

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