Influence of deposition temperature on the properties of high-reflectivity coatings

Optical Engineering

Volumn 45, Issue 6, 2006, Pages

  Zhan, Meiqiong ^a   Tan, Tianya ^a   Zhang, Dawel ^a   He, Hongbo ^a   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

355 nm; Absorptance; Al2O3; Deposition temperature; High reflectivity; Laser induced damage threshold; MgF2

Indexed keywords

CRYSTAL MICROSTRUCTURE; DEPOSITION; ELECTRON BEAMS; LASER APPLICATIONS; REFLECTIVE COATINGS; SPECTROMETERS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ABSORPTANCE; DEPOSITION TEMPERATURE; ELECTRON-BEAM EVAPORATION; HIGH REFLECTIVITY; LASER-INDUCED DAMAGE THRESHOLD (LIDT);

REFLECTION;

EID: 33748607221     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.2211647     Document Type: Article

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