Gas pressures influence on the optical and mechanical properties of Ta2O5 films produced by reactive low voltage ion plating (RLVIP)

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 53-56

  Strauss, G N ^a   Lechner, W ^a   Pulker, H K ^b  

^a UNIVERSITY OF INNSBRUCK   (Austria)

^b Balzers AG   (Liechtenstein)

Author keywords

Absorption; Density; Ion plating; Refractive index; Stress; Ta2O5

Indexed keywords

AMORPHOUS FILMS; COMPRESSIVE STRESS; DENSITY (SPECIFIC GRAVITY); ELECTRIC ARCS; GLASS; HEAT TREATMENT; LIGHT ABSORPTION; OXIDES; PARTIAL PRESSURE; PLATING; REFRACTIVE INDEX; THICKNESS MEASUREMENT;

ABSORPTION COEFFICIENT; REACTIVE LOW VOLTAGE ION PLATING; TANTALUM OXIDE;

OPTICAL COATINGS;

EID: 0033170186     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00153-4     Document Type: Article

References (22)

1. H.K. Pulker, E. Moll, W. Haag, US Pat. 4,619,748 (priority 1985).
2. J. Edlinger, Thesis: Reaktives Niederspannungs-Ionen-Plattieren, eine Untersuchung des Verfahrens und der erhaltenen Schichten, University of Innsbruck, 1990.
3. H.K. Pulker, J. Vac. Sci. Technol. A 10 (1992) 1669.
4. I. Ohlidal, K. Navratil, E. Schmidt, Appl. Phys. A 29 (1982) 157.
5. A.C. Boccara, D. Fournier, J. Badoz, Appl. Phys. Lett. 36 (2) (1980) 130.
6. Y. -X, Nie, L. Betrand, J. Appl. Phys. 65 (2) (1989) 438.
7. H. Machlab, W.A. McGahan, J.A. Wollam, K. Cole, Thin Solid Films 224 (1993) 22.
8. W.B. Jackson, N.M. Amer, A.C. Boccara, D. Fournier, Appl. Opt. 20 (8) (1981) 1333.
9. N.M. Amer, W.B. Jackson, Semiconductors and Semimetals, Chapter 3, 21(B), Academic Press, New York, 1981 83.
10. A. Saxer, Vuoto XVII 4 (1987) 304.
11. W. Lechner, H.K. Pulker, Proc. Workshop of European Vacuum Coaters 1 (1996) 65.
12. M. Montecchi, E. Masetti, Phys. Rev. B 44 (21) (1991) 11649.
13. A. Bubenzer, P. Koidl, Appl. Opt. 23 (17) (1984) 2886.
14. H.K. Pulker, Coatings on Glass, 3rd. impression (1987) 345.
15. M. Tilsch, V. Scheuer, T. Tschudi, SPIE 3133 (1997) 163.
16. H. Demiryont, J.R. Sites, K. Geib, Appl. Opt. 24 (4) (1985).
17. W.D. Westwood, R.J. Boyton, S.J. Ingrey, J. Vac. Sci. Technol. 11 (1974) 381.
18. C. Ottermann, et al., Thin Solid Films 286 (1996) 32.
19. G.N. Strauss, Q.D. Nguyen, H.K. Pulker, J. Non-Cryst. Solids 218 (1997) 256.
20. P.J. Martin, R.P. Netterfield, Optical films produced by ion based techniques, in: E. Wolf (Ed.), Progress in Optics XXIII, Elsevier, Amsterdam, 1986.
21. 5 films in dependence on the arc current, Vol. 41, Proc. SVC Conf., Boston, 1998, p. 287
22. H. Rigneault, et al., Proc. SPIE 3133 (1997) 176.