Enhancement of surface-damage resistance by removing a subsurface damage in fused silica

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5273, Issue , 2004, Pages 244-249

  Kamimura, T ^a   Akamatsu, S ^a   Yamamoto, M ^a   Yamato, I ^a   Shiba, H ^a   Motokoshi, S ^b   Sakamoto, T ^b   Jitsuno, T ^b   Okamoto, T ^c   Yoshida, K ^d  

^a KOCHI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c Okamoto Optics Works Co Ltd   (Japan)

^d OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

CeO2; Chemical etching; Fused silica; Ion beam etching; Subsurface damage; Surface damage resistance

Indexed keywords

CERIUM COMPOUNDS; ELECTROMAGNETIC FIELDS; ETCHING; FRACTURE; ION BEAMS; LASER DAMAGE; POLISHING; SURFACE PROPERTIES;

CEO2; CHEMICAL ETCHING; ION-BEAM ETCHING; SUBSURFACE DAMAGE; SURFACE DAMAGE RESISTANCE;

FUSED SILICA;

EID: 5544251278     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.524961     Document Type: Conference Paper

References (7)

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