Ion etching of fused silica glasses for high-power lasers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 4840-4841

  Kamimura, Tomosumi ^a   Mori, Yusuke ^a   Sasaki, Takatomo ^a   Yoshida, Hidetsugu ^a   Okamoto, Takayuki ^b   Yoshida, Kunio ^c  

^a OSAKA UNIVERSITY   (Japan)

^b Okamoto Optics Works Co Ltd   (Japan)

^c OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ion etching; Laser induced surface damage; Subsurface fissure; Surface roughness

Indexed keywords

FUSED SILICA; HIGH POWER LASERS; LASER DAMAGE; MAGNETRON SPUTTERING; REACTIVE ION ETCHING; SURFACE ROUGHNESS; SURFACE TREATMENT;

FISSURES; FUSED SILICA GLASSES; LASER DAMAGE THRESHOLDS; OPTICAL POLISHING;

SEMICONDUCTING GLASS;

EID: 0032154650     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4840     Document Type: Article

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