Improvement of laser-induced surface damage in UV optics by ion beam etching (CsLiB6O10 and fused silica)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3578, Issue , 1999, Pages 695-701

  Kamimura, T ^a   Nakai, K ^a   Mori, Y ^a   Sasaki, T ^a   Yoshida, H ^a   Nakatuka, M ^a   Tanaka, M ^a,a   Toda, S ^a   Yoshida, K ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CESIUM COMPOUNDS; ETCHING; FUSED SILICA; ION BEAMS; OPTICAL GLASS; POLISHING; ULTRAVIOLET RADIATION;

ION BEAM ETCHING; LASER-INDUCED DAMAGE THRESHOLD (LIDT);

LASER DAMAGE;

EID: 0032631163     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.344405     Document Type: Conference Paper

References (9)