Rapid photoreflectance spectroscopy for strained silicon metrology

Review of Scientific Instruments

Volumn 79, Issue 10, 2008, Pages

  Chouaib, H ^a,d   Murtagh, M E ^g   Gunebaut V ^a,e   Ward, S ^a   Kelly, P V ^a,f   Kennard, M ^b   Le Vaillant, Y M ^b   Somekh, M G ^c   Pitter, M C ^c   Sharples, S D ^c  

^a 2200 Cork Airport Business Park   (Ireland)

^b PARC TECHNOLOGIQUE DES FONTAINES   (France)

^c UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^d KLA Tencor   (United States)

^e Nualight Europe   (Ireland)

^f NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^g NONE

Author keywords

[No Author keywords available]

Indexed keywords

EQUIPMENT, DEVICES AND APPARATUS; INSTRUMENTS;

GOOD CORRELATIONS; ONLINE MONITORING; PHOTOREFLECTANCE SPECTROSCOPY; PRIOR ARTS; RAPID ACQUISITION; SILICON BAND GAP;

STRAINED SILICON;

EID: 55349108517     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2999919     Document Type: Conference Paper

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