Molecular-scale growth of silicon oxide on polymer substrate through vacuum ultraviolet light-assisted photooxidation of organosilane precursor

Thin Solid Films

Volumn 437, Issue 1-2, 2003, Pages 89-94

  Hozumi, Atsushi ^a   Inagai, Hironobu ^b   Yokogawa, Yoshiyuki ^a   Kameyama, Tetsuya ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b CHUBU UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Polystyrene; Silicon oxide; Vacuum ultraviolet light

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GLASS TRANSITION; PHOTOOXIDATION; POLYMERS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

PRECURSORS;

SILICA;

EID: 0038108786     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00662-X     Document Type: Article

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