Optical third-order nonlinearity by nanosecond and picosecond pulses in Cu nanoparticles in ion-implanted silica

Journal of Applied Physics

Volumn 104, Issue 1, 2008, Pages

  Torres Torres, C ^a   Reyes Esqueda, J A ^a   Cheang Wong, J C ^a   Crespo Sosa, A ^a   Rodriguez Fernandez L ^a   Oliver, A ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; ABSORPTION; COPPER; COPPER ALLOYS; ELECTROMAGNETIC WAVE ABSORPTION; ENERGY ABSORPTION; HOT ELECTRONS; ION BOMBARDMENT; ION IMPLANTATION; KERR MAGNETOOPTICAL EFFECT; LIGHT ABSORPTION; MAGNETIC FIELD EFFECTS; MAGNETOOPTICAL EFFECTS; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NONLINEAR OPTICS; OPTICAL PROPERTIES; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; TERNARY SYSTEMS; ULTRASHORT PULSES;

ABLATION THRESHOLDS; AMERICAN INSTITUTE OF PHYSICS (AIP); CU NANO-PARTICLES; ELECTRONIC POLARIZATION; HIGH-PURITY; KERR EFFECTS; LINEAR OPTICAL ABSORPTION; NONLINEAR OPTICAL ABSORPTION; NONLINEAR REFRACTION (NLR); OPTICAL (PET) (OPET); OPTICAL ABSORPTION (OA); PICO SECOND PULSES; PICOSECOND REGIME; SELF DIFFRACTIONS; THIRD-ORDER NON-LINEARITY; THIRD-ORDER NONLINEAR OPTICAL SUSCEPTIBILITIES;

OPTICAL KERR EFFECT;

EID: 47749154817     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2952040     Document Type: Article

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