X-ray source with cold emitter fabricated using ZnO conductive whiskers

Japanese Journal of Applied Physics

Volumn 47, Issue 9 PART 1, 2008, Pages 7303-7307

  Ooki, Satoshi ^a   Ohshio, Shigeo ^a   Nishino, Junichi ^b   Ohkawara, Yoshiaki ^a,c   Ito, Haruhiko ^a   Saitoh, Hidetoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^b FUKUI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^c Ookawara Manufacturing   (Japan)

Author keywords

CVD; Field emission; Whisker; X ray; ZnO

Indexed keywords

AGGLOMERATION; ALUMINA; ALUMINUM; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); ELECTRON SOURCES; FIELD EMISSION; FIELD EMISSION CATHODES; IMAGE ENHANCEMENT; REAL TIME SYSTEMS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SILICON WAFERS; SURFACE STRUCTURE; TUNGSTEN; X RAY ANALYSIS; X RAY APPARATUS; X RAY OPTICS; ZINC; ZINC ALLOYS; ZINC OXIDE;

AL CONCENTRATIONS; COLD CATHODES; CVD; DEPOSITION METHODS; ELECTRON EMISSION CURRENTS; NEW STRUCTURES; SET-UPS; SOURCE SYSTEMS; WHISKER; X-RAY; ZNO; ALUMINUM-DOPED ZINC OXIDES; MEDICAL X-RAYS; SINGLE-CRYSTALLINE; X-RAY IMAGES; X-RAY SOURCES; ZNO:AL WHISKERS;

X RAYS;

EID: 55149104784     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.7303     Document Type: Article

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