Epitaxial growth mechanism of chemical-vapor-deposited anatase on strontium titanate substrate

Journal of the Ceramic Society of Japan

Volumn 106, Issue 11, 1998, Pages 1051-1055

  Saitoh, Hidetoshi ^a   Sunayama, Hideki ^a   Tanaka, Norio ^a   Ohshio, Shigeo ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

AFM; Anatase; CVD; Epitaxy; Growth mechanism; SrTiO3; TEM; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; NUCLEATION; SINGLE CRYSTALS; STRONTIUM COMPOUNDS; SURFACE STRUCTURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

STRANSKI-KRASTANOV GROWTH; STRONTIUM TITANATE; TITANIUM TETRAISOPROPOXIDE;

TITANIUM DIOXIDE;

EID: 0032207329     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.106.1051     Document Type: Article

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