High-rate epitaxy of anatase films by atmospheric chemical vapor deposition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 2 B, 2000, Pages

  Tokita, Shuji ^a   Tanaka, Norio ^b   Saitoh, Hidetoshi ^c  

^a Kousei Co

^b Environmental Science Research Niigata   (Japan)

^c NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM PREPARATION; MAGNESIA; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS;

ANATASE CRYSTAL; ANATASE FILMS; ANATASE POLYCRYSTALLINE FILMS; METHYLENE BLUE; STRONTIUM TITANATE;

THICK FILMS;

EID: 0033891174     PISSN: 00214922     EISSN: None     Source Type: None    
DOI: 10.1143/JJAP.39.L169     Document Type: Article

References (5)