Pulsed laser deposition of the yttria-stabilized zirconia films

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 648-651

  Shin, Joonghan ^a   Li, Peng ^b   Mazumder, J ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b GE GLOBAL RESEARCH   (China)

Author keywords

Atomic force microscopy; Nano indentation; Pulsed laser deposition; Thin film; X ray diffraction; Yttria stabilized zirconia

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; DIFFRACTION; EXCIMER LASERS; GAS LASERS; KRYPTON; LASERS; MECHANICAL PROPERTIES; MICROSCOPES; MICROSCOPIC EXAMINATION; NANOINDENTATION; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; THICK FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; YTTRIUM ALLOYS; ZIRCONIA;

AEROSPACE COMMUNITIES; AFM IMAGES; ATOMIC FORCE MICROSCOPES; CHAMBER PRESSURES; ELEMENTAL COMPOSITIONS; FABRICATION TECHNIQUES; KRF EXCIMER LASERS; MORPHOLOGICAL CHARACTERISTICS; NANOINDENTER; OPTICAL; PULSED LASER DEPOSITION TECHNIQUES; PULSED LASERS; SCANNING ELECTRON MICROSCOPES; STABILIZED ZIRCONIAS; STRUCTURAL CHARACTERISTICS; X-RAY DIFFRACTIONS; YOUNG'S MODULUS; YSZ FILMS;

YTTRIA STABILIZED ZIRCONIA;

EID: 55049115673     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.07.027     Document Type: Article

References (25)

1. Sankur H., DeNatale J., Gunning W., and Nelson J.G. J. Vac. Sci. Technol., A 5 (1987) 2869
2. Chuang M.C., and Smith G.A. J. Vac. Sci. Technol., A 9 (1991) 2397
3. Gottmann J., Husmann A., Klotzbücher T., and Kreutz E.W. Surf. Coat. Technol. 100/101 (1998) 415
4. Zhao Z.W., Tay B.K., Huang L., and Yu G.Q. J. Phys., D, Appl. Phys. 37 (2004) 1701
5. Chen K.Y., Salamo G.J., Afonso S., Xu X.L., Tang Y.Q., Xiong Q., Chen F.T., and Schaper L.W. Physica C 267 (1996) 355
6. Aguiar R., Trtik V., Sanchez F., Ferrater C., and Varela M. Thin Solid Films 304 (1997) 225
7. Wang S.J., Ong C.K., Xu S.Y., Chen P., Tjiu W.C., Chai J.W., Huan A.C.H., Yoo W.J., Lim J.S., Feng W., and Choi W.K. Appl. Phys. Lett. 78 (2001) 1604
8. Caricato A.P., Barucca G., Di Cristoforo A., Leggieri G., Luches A., Majni G., Martino M., and Mengucci P. Appl. Surf. Sci. 248 (2005) 270
9. Jamarani F., Korotkin M., Lang R.V., Ouellette M.F., Yan K.L., Bertram R.W., and Parameswaran V.R. Surf. Coat. Technol. 54/55 (1992) 58
10. Hass D.D., Slifka A.J., and Wadley H.N.G. Acta Mater. 49 (2001) 973
11. Chwa S.O., and Ohmori A. Surf. Coat. Technol. 153 (2002) 304
12. Goto T. Solid State Ionics 172 (2004) 225
13. Kimura T., and Goto T. Surf. Coat. Technol. 198 (2005) 129
14. Quinton W.A.J., Liang W.Y., Baudenbacher F., Foord D.T., Bramley A.P., and Newcomb S.B. IEEE Trans. Appl. Supercond. 9 (1999) 1498
15. Qadri S.B., Horwitz J.S., Chrisey D.B., Donovan E.P., and Skelton E.F. Surf. Coat. Technol. 86/87 (1996) 149
16. Kreutz E.W., Alunovic M., Voss A., Pfleging W., Sung H., and Wesner D.A. Surf. Coat. Technol. 68/69 (1994) 238
17. Poirer T., Castell R., and Olivares J.L. Mater. Res. Innov. 2 (1998) 97
18. Vasco E., Vazquez L., Aguilo M., and Zaldo C. J. Cryst. Growth 209 (2000) 883
19. Kokai F. J. Appl. Phys. 72 (1992) 699
20. Maissel L.I., and Glang R. Handbook of Thin Film Technology (1970), MaGraw-Hill 8.32-8.35
21. Chrisey D.B., and Hubler G.K. Pulsed Laser Deposition of Thin Films (1994), Wiley, New York 14-15
22. Yamamoto T., and Mazumder J. Nanostruct. Mater. 7 (1996) 305
23. Chen H., Zhou X., and Ding C. J. Eur. Ceram. Soc. 23 (2003) 1449
24. Ahn Hs., Kim Jy., and Lim Ds. Wear 203/204 (1997) 77-87
25. Batista C., Portinha A., Ribeiro R.M., Teixeira V., Costa M.F., and Oliveira C.R. Surf. Coat. Technol. 200 (2006) 2929