Improvement of fatigue resistance on La modified BiFeO3 thin films

Current Applied Physics

Volumn 9, Issue 2, 2009, Pages 520-523

  Simoes A Z ^a   Cavalcante, L S ^b   Riccardi, C S ^a   Varela, J A ^a   Longo, E ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b FEDERAL UNIVERSITY OF SÃO CARLOS   (Brazil)

Author keywords

BiFeO3; Fatigue resistance; Ferroelectric; Multiferroic

Indexed keywords

CONCENTRATION (PROCESS); FATIGUE OF MATERIALS; PLATINUM; SEMICONDUCTING BISMUTH COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; THIN FILMS;

BFO FILMS; BIFEO3; DIELECTRIC PERMITTIVITIES; FATIGUE BEHAVIORS; FATIGUE RESISTANCE; FATIGUE RESISTANCES; FERROELECTRIC; MULTIFERROIC; POLARIZATION SWITCHING; PREFERRED ORIENTATIONS; SOFT CHEMICAL METHODS; STRUCTURAL DISTORTIONS; X-RAY DIFFRACTIONS;

LANTHANUM;

EID: 55049109487     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2008.05.001     Document Type: Article

References (24)

1. Hur N., Park S., Sharma P.A., Ahn J.S., Guha S., and Cheong S.W. Nature 429 (2004) 392
2. Schmid H. Ferroelectrics 162 (1994) 317
3. Smolenski G.A., and Chupis I.E. Usp. Fiz. Nauk. 137 (1982) 415
4. Gonzalez A.H.M., Simões A.Z., Cavalcante L.S., Longo E., Varela J.A., and Riccardi C.S. Appl. Phys. Lett. 90 (2007) 052906
5. Kim D.H., Lee H.N., Varela M., and Christen H.M. Appl. Phys. Lett. 89 (2006) 162904
6. dos Santos A.M., Parashar S., Raju A.R., Zhao Y.S., Cheetham A.K., and Rao C.N.R. Solid State Commun. 122 (2002) 49
7. Hill N.A. J. Phys. Chem. B 104 (2000) 6694
8. Fiebig M., Lottermoser Th., Fröhlich D., Golsev A.V., and Pisarev R.V. Nature 419 (2002) 19
9. Zheng C.D., Zhang D.M., Yu J., Yang B., Wu Y.Y., Wang L.H., Wang Y.B., and Zhou W.L. Integr. Ferroelectr. 94 (2007) 23
10. Hu G.D., Chen X., Wu W.B., and Yang C.H. Appl. Phys. Lett. 91 (2007) 232909
11. Kawae T., Tsuda H., Shiomoto M., Yamada S., Nagao M., Morimoto A., and Kumeda M. Jpn. J. Appl. Phys. 47 (2008) 237
12. Kubel F., and Schmid H. Acta Crystallogr. Sect. B: Struct. Sci. 46 (1990) 698
13. Fischer P., Polomska M., Sosnowska I., and Szymanski M. J. Phys. C: Solid State Phys. 13 (1980) 1931
14. Wang J., Neaton J.B., Zheng H., Nagarajan V., Ogale S.B., Liu B., Viehland D., Vaithyanathan V., Schlom D.G., Waghmare U.V., Spaldin N.A., Rabe K.M., Wuttig M., and Ramesh R. Science 229 (2003) 1719
15. Chen Y.P., Yao Y.Y., Bao Z.H., Zhu J.S., and Wang Y.N. Mater. Lett. 57 (2003) 3623
16. Simões A.Z., Riccardi C.S., Cavalcante L.S., Longo E., Varela J.A., Mizaikoff B., and Hess D.W. J. Appl. Phys. 101 (2007) 084112
17. Yau C.Y., Palan R., Tran K., and Buchanan R.C. Appl. Phys. Lett. 86 (2005) 032907
18. Kojima T., Sakai T., Watanabe T., and Funakubo H. Appl. Phys. Lett. 80 (2002) 2746
19. Lee J.K., Kim C.H., Suh H.S., and Hong K.S. Appl. Phys. Lett. 80 (2002) 3593
20. Singh V.R., Garg A., and Agrawal D.C. Appl. Phys. Lett. 92 (2008) 152905
21. Cheng Z.X., Wang X.L., Dou S.X., Kimura H., and Ozawa K. Phys. Rev. B. 77 (2008) 092101
22. Singh S.K., Maruyama K., and Ishiwara H. J. Phys. D: Appl. Phys. 40 (2007) 2705
23. Lee Y.-H., Wu J.-M., and Lai C.-H. Appl. Phys. Lett. 88 (2006) 042903
24. Simões A.Z., Ramírez M.A., Gonzalez A.H.M., Riccardi C.S., Ries A., Longo E., and Varela J.A. J. Solid State Chem. 179 (2006) 2206