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Volumn 47, Issue 1, 2008, Pages 237-239

Fabrication of BiFeO3 thick films by a simple liquid-phase epitaxial growth technique

Author keywords

BiFeO3; Infrared irradiation; Liquid phase epitaxy; Pb free materials; Thick films

Indexed keywords

FILM THICKNESS; INFRARED RADIATION; LIQUID PHASE EPITAXY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING BISMUTH COMPOUNDS; X RAY DIFFRACTION;

FREE MATERIALS; INFRARED IRRADIATION; INPLANE SIZE; MULTIGRAIN STRUCTURE;

THICK FILMS;

EID: 38549112922 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.237 Document Type: Article

Times cited : (3)

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