Polyelectrolyte negative resist patterns as templates for the electrostatic assembly of nanoparticles and electroless deposition of metallic films

Advanced Materials

Volumn 20, Issue 13, 2008, Pages 2561-2566

  Ofir, Yuval ^a   Samanta, Bappaditya ^a   Xiao, Qijun ^a   Jordan, Brian J ^a   Xu, Hao ^a   Arumugam, Palaniappan ^a   Arvizo, Rochelle ^a   Tuominen, Mark T ^a   Rotello, Vincent M ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; ASPECT RATIO; ELECTROLESS PLATING; ELECTRON BEAM LITHOGRAPHY; FUNCTIONAL POLYMERS; IRON COMPOUNDS; NANOPARTICLES; NANOSTRUCTURES; NUCLEAR PROPULSION; PHOTORESISTS; POLYELECTROLYTES; POLYMERS; SEMICONDUCTING FILMS; SUPERPARAMAGNETISM; THICK FILMS;

CHARGED MOIETIES; COMPLEX STRUCTURES; DEVICE APPLICATIONS; ELECTROLESS DEPOSITIONS; ELECTROSTATIC ASSEMBLIES; FUNCTIONAL MATERIALS; LBL ASSEMBLIES; MAGNETIC; POLY-ELECTROLYTE; POSITIVELY CHARGED; RATIO FEATURES; RESIST PATTERNS; SEMICONDUCTING NANOPARTICLES; SUPERPARAMAGNETIC; THIN-FILMS;

MAGNETIC THIN FILMS;

EID: 54949155155     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200703095     Document Type: Article

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